Templated self-assembly of Si-containing block copolymers for nanoscale device fabrication
Block copolymers have been proposed for self-assembled nanolithography because they can spontaneously form well-ordered nanoscale periodic patterns of lines or dots in a rapid, low-cost process. By templating the selfassembly, patterns of increasing complexity can be generated, for example arrays of...
| Main Authors: | , , , , , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
SPIE
2010
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| Online Access: | http://hdl.handle.net/1721.1/58560 https://orcid.org/0000-0003-2262-1249 https://orcid.org/0000-0003-3473-446X https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0003-2055-4900 |