Annual report, April 1981 - May 1982 : laser induced deposition of thin films
A new chemical vapor deposition (CVD) process has been demonstrated with Si thin films. In this process, reactant gases are heated by absorbing light energy emitted from an IR laser. No other surfaces are heated by the reaction, thus contamination is eliminated, the state (stress, crystallinity, gra...
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Cambridge, Mass. : Massachusetts Institute of Technology, Energy Laboratory, 1982
2011
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| Online Access: | http://hdl.handle.net/1721.1/60593 |