Structural transitions and relaxation processes during the epitaxial growth of ultrathin CaF2 films on Si(111)
The structure and morphology of ultrathin lattice matched CaF2 films of very few monolayers thickness, which were deposited on Si(111) substrates by molecular-beam epitaxy, have been studied in situ by synchrotron based grazing incidence x-ray diffraction. Even for the thinnest investigated film of...
Main Authors: | Deiter, Carsten, Bierkandt, Markus, Klust, Andreas, Kumpf, Christian, Su, Yixi, Bunk, Oliver, Feidenhans’l, Robert, Wollschlager, Joachim |
---|---|
Other Authors: | Massachusetts Institute of Technology. Department of Chemistry |
Format: | Article |
Language: | en_US |
Published: |
American Physical Society
2011
|
Online Access: | http://hdl.handle.net/1721.1/64978 |
Similar Items
-
Growth of metastable 2H-CaSi2 films on Si(111) substrates with ultrathin SiO2 films by solid phase epitaxy
by: Keiichiro Oh-ishi, et al.
Published: (2023-01-01) -
Variability and high temperature reliability of graphene field-effect transistors with thin epitaxial CaF2 insulators
by: Yu. Yu. Illarionov, et al.
Published: (2024-03-01) -
The relaxation of epitaxial islands
by: Gill, S, et al.
Published: (1999) -
Structure-Related Electronic and Magnetic Properties in Ultrathin Epitaxial Ni<sub>x</sub>Fe<sub>3−x</sub>O<sub>4</sub> Films on MgO(001)
by: Jari Rodewald, et al.
Published: (2024-04-01) -
Scintillation properties of pure CaF2
by: Mikhailik, V, et al.
Published: (2006)