Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2012
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| Online Access: | http://hdl.handle.net/1721.1/68504 |
| _version_ | 1811098146696069120 |
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| author | Manfrinato, Vitor Riseti |
| author2 | Karl K. Berggren. |
| author_facet | Karl K. Berggren. Manfrinato, Vitor Riseti |
| author_sort | Manfrinato, Vitor Riseti |
| collection | MIT |
| description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011. |
| first_indexed | 2024-09-23T17:10:37Z |
| format | Thesis |
| id | mit-1721.1/68504 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T17:10:37Z |
| publishDate | 2012 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/685042019-04-12T15:20:00Z Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots Manfrinato, Vitor Riseti Karl K. Berggren. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011. Cataloged from PDF version of thesis. Includes bibliographical references (p. 53-55). This thesis presents the investigation of resolution limits of electron-beam lithography (EBL) at the sub-10-nm scale. EBL patterning was investigated at low electron energy (2 keV) in a converted scanning electron microscope and at high electron energy (200 keV) in an aberration-corrected scanning transmission electron microscope. Sub-10-nm structures were fabricated and proximity effects were evaluated in both conditions. As an application of sub-10-nm EBL, this thesis presents a templated-self-assembly technique to control the position of individual colloidal quantum dots smaller than 10 nm. by Vitor Riseti Manfrinato. S.M. 2012-01-12T19:32:57Z 2012-01-12T19:32:57Z 2011 2011 Thesis http://hdl.handle.net/1721.1/68504 770675473 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 55 p. application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science. Manfrinato, Vitor Riseti Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots |
| title | Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots |
| title_full | Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots |
| title_fullStr | Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots |
| title_full_unstemmed | Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots |
| title_short | Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots |
| title_sort | sub 10 nm electron beam lithography for templated placement of colloidal quantum dots |
| topic | Electrical Engineering and Computer Science. |
| url | http://hdl.handle.net/1721.1/68504 |
| work_keys_str_mv | AT manfrinatovitorriseti sub10nmelectronbeamlithographyfortemplatedplacementofcolloidalquantumdots |