Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots

Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.

Bibliographic Details
Main Author: Manfrinato, Vitor Riseti
Other Authors: Karl K. Berggren.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2012
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/68504

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