Processing and properties of ytterbium-erbium silicate thin film gain media
The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er[subscript 2]O[subscript 3], Yb[subscript 2]O[subscript 3] and SiO[subscript 2] on c-Si and subsequent annealing in N[subscript...
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Institute of Electrical and Electronics Engineers (IEEE)
2012
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Online Access: | http://hdl.handle.net/1721.1/73453 https://orcid.org/0000-0002-3913-6189 |
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author | Vanhoutte, Michiel Wang, Bing Michel, Jurgen Kimerling, Lionel C. |
author2 | MIT Materials Research Laboratory |
author_facet | MIT Materials Research Laboratory Vanhoutte, Michiel Wang, Bing Michel, Jurgen Kimerling, Lionel C. |
author_sort | Vanhoutte, Michiel |
collection | MIT |
description | The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er[subscript 2]O[subscript 3], Yb[subscript 2]O[subscript 3] and SiO[subscript 2] on c-Si and subsequent annealing in N[subscript 2] or O[subscript 2] atmosphere. |
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format | Article |
id | mit-1721.1/73453 |
institution | Massachusetts Institute of Technology |
language | en_US |
last_indexed | 2024-09-23T14:22:14Z |
publishDate | 2012 |
publisher | Institute of Electrical and Electronics Engineers (IEEE) |
record_format | dspace |
spelling | mit-1721.1/734532022-09-29T09:00:59Z Processing and properties of ytterbium-erbium silicate thin film gain media Vanhoutte, Michiel Wang, Bing Michel, Jurgen Kimerling, Lionel C. MIT Materials Research Laboratory Massachusetts Institute of Technology. Department of Materials Science and Engineering Massachusetts Institute of Technology. Microphotonics Center Kimerling, Lionel C. Vanhoutte, Michiel Wang, Bing Michel, Jurgen The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er[subscript 2]O[subscript 3], Yb[subscript 2]O[subscript 3] and SiO[subscript 2] on c-Si and subsequent annealing in N[subscript 2] or O[subscript 2] atmosphere. United States. Air Force Office of Scientific Research. Multidisciplinary University Research Initiative 2012-09-27T21:21:42Z 2012-09-27T21:21:42Z 2009-09 Article http://purl.org/eprint/type/ConferencePaper 978-1-4244-4403-8 http://hdl.handle.net/1721.1/73453 Vanhoutte, Michiel et al. “Processing and properties of ytterbium-erbium silicate thin film gain media.” IEEE, 2009. 63-65. © Copyright 2009 IEEE https://orcid.org/0000-0002-3913-6189 en_US http://dx.doi.org/10.1109/GROUP4.2009.5338289 Proceedings of the 6th IEEE International Conference on Group IV Photonics, 2009 (GFP '09) Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf Institute of Electrical and Electronics Engineers (IEEE) IEEE |
spellingShingle | Vanhoutte, Michiel Wang, Bing Michel, Jurgen Kimerling, Lionel C. Processing and properties of ytterbium-erbium silicate thin film gain media |
title | Processing and properties of ytterbium-erbium silicate thin film gain media |
title_full | Processing and properties of ytterbium-erbium silicate thin film gain media |
title_fullStr | Processing and properties of ytterbium-erbium silicate thin film gain media |
title_full_unstemmed | Processing and properties of ytterbium-erbium silicate thin film gain media |
title_short | Processing and properties of ytterbium-erbium silicate thin film gain media |
title_sort | processing and properties of ytterbium erbium silicate thin film gain media |
url | http://hdl.handle.net/1721.1/73453 https://orcid.org/0000-0002-3913-6189 |
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