Processing and properties of ytterbium-erbium silicate thin film gain media

The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er[subscript 2]O[subscript 3], Yb[subscript 2]O[subscript 3] and SiO[subscript 2] on c-Si and subsequent annealing in N[subscript...

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Main Authors: Vanhoutte, Michiel, Wang, Bing, Michel, Jurgen, Kimerling, Lionel C.
Other Authors: MIT Materials Research Laboratory
Format: Article
Language:en_US
Published: Institute of Electrical and Electronics Engineers (IEEE) 2012
Online Access:http://hdl.handle.net/1721.1/73453
https://orcid.org/0000-0002-3913-6189
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author Vanhoutte, Michiel
Wang, Bing
Michel, Jurgen
Kimerling, Lionel C.
author2 MIT Materials Research Laboratory
author_facet MIT Materials Research Laboratory
Vanhoutte, Michiel
Wang, Bing
Michel, Jurgen
Kimerling, Lionel C.
author_sort Vanhoutte, Michiel
collection MIT
description The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er[subscript 2]O[subscript 3], Yb[subscript 2]O[subscript 3] and SiO[subscript 2] on c-Si and subsequent annealing in N[subscript 2] or O[subscript 2] atmosphere.
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spelling mit-1721.1/734532022-09-29T09:00:59Z Processing and properties of ytterbium-erbium silicate thin film gain media Vanhoutte, Michiel Wang, Bing Michel, Jurgen Kimerling, Lionel C. MIT Materials Research Laboratory Massachusetts Institute of Technology. Department of Materials Science and Engineering Massachusetts Institute of Technology. Microphotonics Center Kimerling, Lionel C. Vanhoutte, Michiel Wang, Bing Michel, Jurgen The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er[subscript 2]O[subscript 3], Yb[subscript 2]O[subscript 3] and SiO[subscript 2] on c-Si and subsequent annealing in N[subscript 2] or O[subscript 2] atmosphere. United States. Air Force Office of Scientific Research. Multidisciplinary University Research Initiative 2012-09-27T21:21:42Z 2012-09-27T21:21:42Z 2009-09 Article http://purl.org/eprint/type/ConferencePaper 978-1-4244-4403-8 http://hdl.handle.net/1721.1/73453 Vanhoutte, Michiel et al. “Processing and properties of ytterbium-erbium silicate thin film gain media.” IEEE, 2009. 63-65. © Copyright 2009 IEEE https://orcid.org/0000-0002-3913-6189 en_US http://dx.doi.org/10.1109/GROUP4.2009.5338289 Proceedings of the 6th IEEE International Conference on Group IV Photonics, 2009 (GFP '09) Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf Institute of Electrical and Electronics Engineers (IEEE) IEEE
spellingShingle Vanhoutte, Michiel
Wang, Bing
Michel, Jurgen
Kimerling, Lionel C.
Processing and properties of ytterbium-erbium silicate thin film gain media
title Processing and properties of ytterbium-erbium silicate thin film gain media
title_full Processing and properties of ytterbium-erbium silicate thin film gain media
title_fullStr Processing and properties of ytterbium-erbium silicate thin film gain media
title_full_unstemmed Processing and properties of ytterbium-erbium silicate thin film gain media
title_short Processing and properties of ytterbium-erbium silicate thin film gain media
title_sort processing and properties of ytterbium erbium silicate thin film gain media
url http://hdl.handle.net/1721.1/73453
https://orcid.org/0000-0002-3913-6189
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