On the 1/f noise of atomic-layer-deposition metal films
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, February 2012.
Main Author: | Wang, Xiawa |
---|---|
Other Authors: | Aleksandar Kojic and James K. Roberge. |
Format: | Thesis |
Language: | eng |
Published: |
Massachusetts Institute of Technology
2013
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/77000 |
Similar Items
-
Atomic layer deposition of noble metal thin films
by: Thong, Claudia Xinyi
Published: (2022) -
Noble metal alloy thin films by atomic layer deposition and rapid Joule heating
by: Guo, Yuanyuan, et al.
Published: (2022) -
Atomic layer deposition of metallic tri-layer for alloy formation
by: Yong, Sidney Kwong Roong
Published: (2022) -
Development of noble metal-based high entropy alloy thin film by atomic layer deposition
by: Zou, Yiming
Published: (2024) -
Atomic stacking configurations in atomic layer deposited TiN films
by: Park, H. S., et al.
Published: (2012)