Optical gain and lasing from band-engineered Ge-on-Si at room temperature

We present theoretical modeling and experimental results of optical gain and lasing from tensile-strained, n[superscript +] Ge-on-Si at room temperature. Compatible with silicon CMOS, these devices are ideal for large-scale electronic-photonic integration on Si.

Bibliographic Details
Main Authors: Liu, Jifeng, Sun, Xiaochen, Camacho-Aguilera, Rodolfo Ernesto, Cai, Yan, Kimerling, Lionel C., Michel, Jurgen
Other Authors: MIT Materials Research Laboratory
Format: Article
Language:en_US
Published: Institute of Electrical and Electronics Engineers (IEEE) 2013
Online Access:http://hdl.handle.net/1721.1/79799
https://orcid.org/0000-0002-3913-6189
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author Liu, Jifeng
Sun, Xiaochen
Camacho-Aguilera, Rodolfo Ernesto
Cai, Yan
Kimerling, Lionel C.
Michel, Jurgen
author2 MIT Materials Research Laboratory
author_facet MIT Materials Research Laboratory
Liu, Jifeng
Sun, Xiaochen
Camacho-Aguilera, Rodolfo Ernesto
Cai, Yan
Kimerling, Lionel C.
Michel, Jurgen
author_sort Liu, Jifeng
collection MIT
description We present theoretical modeling and experimental results of optical gain and lasing from tensile-strained, n[superscript +] Ge-on-Si at room temperature. Compatible with silicon CMOS, these devices are ideal for large-scale electronic-photonic integration on Si.
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spelling mit-1721.1/797992022-10-01T07:42:30Z Optical gain and lasing from band-engineered Ge-on-Si at room temperature Liu, Jifeng Sun, Xiaochen Camacho-Aguilera, Rodolfo Ernesto Cai, Yan Kimerling, Lionel C. Michel, Jurgen MIT Materials Research Laboratory Massachusetts Institute of Technology. Department of Materials Science and Engineering Massachusetts Institute of Technology. Microphotonics Center Liu, Jifeng Sun, Xiaochen Camacho-Aguilera, Rodolfo Ernesto Cai, Yan Kimerling, Lionel C. Michel, Jurgen We present theoretical modeling and experimental results of optical gain and lasing from tensile-strained, n[superscript +] Ge-on-Si at room temperature. Compatible with silicon CMOS, these devices are ideal for large-scale electronic-photonic integration on Si. United States. Air Force Office of Scientific Research. Multidisciplinary University Research Initiative 2013-08-08T13:50:12Z 2013-08-08T13:50:12Z 2010-07 Article http://purl.org/eprint/type/ConferencePaper 978-1-4244-6785-3 http://hdl.handle.net/1721.1/79799 Jifeng, Liu et al. "Optical gain and lasing from band-engineered Ge-on-Si at room temperature." 15th OptoElectronics and Communications Conference (OECC2010) Technical Digest, July 2010, Sapporo Convention Center, Japan. Copyright © 2010, by The Institute of Electronics, Information and Communication Engineers https://orcid.org/0000-0002-3913-6189 en_US http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=5588537 Proceedings of the 2010 15th OptoeElectronics and Communications Conference (OECC) Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf Institute of Electrical and Electronics Engineers (IEEE) MIT web domain
spellingShingle Liu, Jifeng
Sun, Xiaochen
Camacho-Aguilera, Rodolfo Ernesto
Cai, Yan
Kimerling, Lionel C.
Michel, Jurgen
Optical gain and lasing from band-engineered Ge-on-Si at room temperature
title Optical gain and lasing from band-engineered Ge-on-Si at room temperature
title_full Optical gain and lasing from band-engineered Ge-on-Si at room temperature
title_fullStr Optical gain and lasing from band-engineered Ge-on-Si at room temperature
title_full_unstemmed Optical gain and lasing from band-engineered Ge-on-Si at room temperature
title_short Optical gain and lasing from band-engineered Ge-on-Si at room temperature
title_sort optical gain and lasing from band engineered ge on si at room temperature
url http://hdl.handle.net/1721.1/79799
https://orcid.org/0000-0002-3913-6189
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