Modeling poly-silicon gate depletion in submicron MOS devices
Thesis (M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1999.
Main Author: | Li, James Chingwei, 1975- |
---|---|
Other Authors: | Stephen D. Senturia. |
Format: | Thesis |
Language: | eng |
Published: |
Massachusetts Institute of Technology
2013
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/80100 |
Similar Items
-
Quantum mechanical transport in submicron electronic devices
by: Bagwell, Philip F. (Philip Frederick)
Published: (2009) -
Novel transistor structures for future deep submicron MOS applications
by: Theng, Ah Leong
Published: (2010) -
Rapid fabrication of deep-submicron Josephson junctions
by: Cord, Bryan M. (Bryan Michael), 1980-
Published: (2005) -
Development of metal silicides for deep submicron polycrystalline silicon gate
by: Pang, Chong Hau
Published: (2008) -
Optimal digital system design in deep submicron technology
by: Heo, Seongmoo, 1977-
Published: (2007)