Distortion analysis on an improved mask technology for X-ray lithography

Distortion analysis on an improved mask technology for X-ray lithography

Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1999.

Bibliographic Details
Main Author:	Pipe, Kevin P. (Kevin Patrick), 1976-
Other Authors:	Henry I. Smith.
Format:	Thesis
Language:	eng
Published:	Massachusetts Institute of Technology 2013
Subjects:	Electrical Engineering and Computer Science
Online Access:	http://hdl.handle.net/1721.1/80560

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