Chip-scale modeling of pattern dependencies in copper chemical mechanical polishing processes

Chip-scale modeling of pattern dependencies in copper chemical mechanical polishing processes

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2002.

Bibliographic Details
Main Author: Gbondo-Tugbawa, Tamba Edward
Other Authors: Duane S. Boning.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2005
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/8083

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