A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications
Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2012.
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| Other Authors: | |
| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2014
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| Online Access: | http://hdl.handle.net/1721.1/85231 |
| _version_ | 1826211389627170816 |
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| author | Yin, Allen Shiping |
| author2 | Marc A. Baldo. |
| author_facet | Marc A. Baldo. Yin, Allen Shiping |
| author_sort | Yin, Allen Shiping |
| collection | MIT |
| description | Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2012. |
| first_indexed | 2024-09-23T15:05:08Z |
| format | Thesis |
| id | mit-1721.1/85231 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T15:05:08Z |
| publishDate | 2014 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/852312019-04-12T20:26:30Z A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications Yin, Allen Shiping Marc A. Baldo. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2012. This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections. Cataloged from student-submitted PDF version of thesis. Includes bibliographical references (pages 91-92). Lithography processes harnessing the phase change of the chemically inert carbon dioxide as a resist have been shown as a possible alternative to patterning thin film organic semiconductors and metals. The ability to control the resist's growth would make the lithography process more reliable and ecient. This thesis seeks to control and observe the physical properties of the carbon dioxide resist via the optical technique of dual-laser interferometry in conjunction with a quartz crystal micro balance (QCMB). by Allen Shiping Yin. M. Eng. 2014-03-05T15:56:46Z 2014-03-05T15:56:46Z 2012 2012 Thesis http://hdl.handle.net/1721.1/85231 871171491 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 92 pages application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science. Yin, Allen Shiping A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications |
| title | A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications |
| title_full | A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications |
| title_fullStr | A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications |
| title_full_unstemmed | A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications |
| title_short | A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications |
| title_sort | dual laser interferometry system for thin film measurements in thermal vapor deposition applications |
| topic | Electrical Engineering and Computer Science. |
| url | http://hdl.handle.net/1721.1/85231 |
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