Directed Self-Assembly at the 10 nm Scale by Using Capillary Force-Induced Nanocohesion

We demonstrated a new nanoassembly strategy based on capillary force-induced cohesion of high-aspect ratio nanostructures made by electron-beam lithography. Using this strategy, ordered complex pattern were fabricated from individual nanostructures at the 10 nm length scale. This method enables the...

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Chi tiết về thư mục
Những tác giả chính: Duan, Huigao, Berggren, Karl K.
Tác giả khác: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Định dạng: Bài viết
Ngôn ngữ:en_US
Được phát hành: American Chemical Society (ACS) 2014
Truy cập trực tuyến:http://hdl.handle.net/1721.1/85959
https://orcid.org/0000-0001-7453-9031
Miêu tả
Tóm tắt:We demonstrated a new nanoassembly strategy based on capillary force-induced cohesion of high-aspect ratio nanostructures made by electron-beam lithography. Using this strategy, ordered complex pattern were fabricated from individual nanostructures at the 10 nm length scale. This method enables the formation of complex designed networks from a sparse array of nanostructures, suggesting a number of potential applications in fabrication of nanodevices, nanopatterning, and fluid-flow investigations.