Modeling of chemical mechanical polishing for shallow trench isolation
Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000.
| Príomhchruthaitheoir: | |
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| Rannpháirtithe: | |
| Formáid: | Tráchtas |
| Teanga: | eng |
| Foilsithe / Cruthaithe: |
Massachusetts Institute of Technology
2014
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| Ábhair: | |
| Rochtain ar líne: | http://hdl.handle.net/1721.1/86469 |
| _version_ | 1826217496188813312 |
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| author | Gan, Terence (Terence Chihkiong), 1975- |
| author2 | Duane S. Boning. |
| author_facet | Duane S. Boning. Gan, Terence (Terence Chihkiong), 1975- |
| author_sort | Gan, Terence (Terence Chihkiong), 1975- |
| collection | MIT |
| description | Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000. |
| first_indexed | 2024-09-23T17:04:35Z |
| format | Thesis |
| id | mit-1721.1/86469 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T17:04:35Z |
| publishDate | 2014 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/864692019-04-11T12:19:56Z Modeling of chemical mechanical polishing for shallow trench isolation Gan, Terence (Terence Chihkiong), 1975- Duane S. Boning. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000. Includes bibliographical references (p. 75-77). by Terence Gan. S.B.and M.Eng. 2014-05-07T16:43:19Z 2014-05-07T16:43:19Z 2000 2000 Thesis http://hdl.handle.net/1721.1/86469 46842506 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 97 p. application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science. Gan, Terence (Terence Chihkiong), 1975- Modeling of chemical mechanical polishing for shallow trench isolation |
| title | Modeling of chemical mechanical polishing for shallow trench isolation |
| title_full | Modeling of chemical mechanical polishing for shallow trench isolation |
| title_fullStr | Modeling of chemical mechanical polishing for shallow trench isolation |
| title_full_unstemmed | Modeling of chemical mechanical polishing for shallow trench isolation |
| title_short | Modeling of chemical mechanical polishing for shallow trench isolation |
| title_sort | modeling of chemical mechanical polishing for shallow trench isolation |
| topic | Electrical Engineering and Computer Science. |
| url | http://hdl.handle.net/1721.1/86469 |
| work_keys_str_mv | AT ganterenceterencechihkiong1975 modelingofchemicalmechanicalpolishingforshallowtrenchisolation |