Modeling of chemical mechanical polishing for shallow trench isolation

Modeling of chemical mechanical polishing for shallow trench isolation

Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000.

Библиографические подробности
Главный автор: Gan, Terence (Terence Chihkiong), 1975-
Другие авторы: Duane S. Boning.
Формат: Диссертация
Язык:eng
Опубликовано: Massachusetts Institute of Technology 2014
Предметы:
Electrical Engineering and Computer Science.
Online-ссылка:http://hdl.handle.net/1721.1/86469

Internet

http://hdl.handle.net/1721.1/86469

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