Modeling and analysis of extrusion-spin coating : an efficient and deterministic photoresist coating method in microlithography
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2001.
Main Author: | Han, Sangjun, 1972- |
---|---|
Other Authors: | Jung-Hoon Chun. |
Format: | Thesis |
Language: | eng |
Published: |
Massachusetts Institute of Technology
2005
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/8694 |
Similar Items
-
Optimization of process variables in extrusion-spin coating
by: Han, Sangjun, 1972-
Published: (2008) -
Characterisation and applications of chemically amplified photoresists for DUV microlithography
by: Koh, Hui Peng.
Published: (2008) -
A new coating method for semiconductor lithography : fluid layer overlap in extrusion-spin coating
by: Derksen, James Stephen
Published: (2008) -
Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography
by: Vitor Vlnieska, et al.
Published: (2020-10-01) -
A study of solvent-rich environments for evaporation rate control in the extrusion spin coating process
by: Fan, Winston Chi Hang, 1975-
Published: (2006)