The hydrogen-induced piezoelectric effect in InP HEMTs

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2003.

Bibliographic Details
Main Author: Mertens, Samuel D. (Samuel David), 1975-
Other Authors: Jesús A. del Alamo.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2014
Subjects:
Online Access:http://hdl.handle.net/1721.1/87453
_version_ 1811088474844954624
author Mertens, Samuel D. (Samuel David), 1975-
author2 Jesús A. del Alamo.
author_facet Jesús A. del Alamo.
Mertens, Samuel D. (Samuel David), 1975-
author_sort Mertens, Samuel D. (Samuel David), 1975-
collection MIT
description Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2003.
first_indexed 2024-09-23T14:02:43Z
format Thesis
id mit-1721.1/87453
institution Massachusetts Institute of Technology
language eng
last_indexed 2024-09-23T14:02:43Z
publishDate 2014
publisher Massachusetts Institute of Technology
record_format dspace
spelling mit-1721.1/874532019-04-11T09:05:19Z The hydrogen-induced piezoelectric effect in InP HEMTs Mertens, Samuel D. (Samuel David), 1975- Jesús A. del Alamo. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2003. Includes bibliographical references (p. 117-125). Hydrogen exposure of III-V HEMTs has been shown to cause a threshold voltage shift, [delta] V[sub]T. This is a serious reliability concern. This effect has been attributed to a H-induced piezoelectric effect. Formation of TiH[sub]x expands the Ti layer in the gate, causing mechanical stress in the underlying semiconductor. This induces piezoelectric charge in the heterostructure underneath the gate that shifts the threshold voltage. This thesis investigates the influence of the gate and heterostructure dimensions and composition on the H-induced [delta] V[sub]T in order to come up with practical device level solutions to this problem. Towards this goal, a model for the impact of the hydrogen-induced piezoelectric effect on the threshold voltage of InP HEMTs was developed using 2D finite element simulations to calculate the mechanical stress caused by a Ti-containing gate that has expanded due to hydrogen absorption. A simple electrostatics model was used to calculate the impact of this piezoelectric polarization charge on the threshold voltage. This model explained the experimentally observed gate length dependence of AVT in InP HEMTs. Then, this model was experimentally verified using advanced InP HEMTs with a WSiN/Ti/Pt/Au gate or a thick Ti-layer in the Ti/Pt/Au gate stack. We have found that only a thin top layer of the thick Ti layer expanded after exposure to hydrogen. The impact of hydrogen on the threshold voltage of these devices is one order of magnitude smaller than conventional Ti/Pt/Au-gate HEMTs. The model showed that there are two main causes for the improvement of the H-sensitivity. First, the separation of the Ti-layer from the semiconductor by a thick non-expanding layer significantly reduces the stress in the active layer. Additionally, the thinner heterostructure and the presence of an InP etch-stop layer with a small piezoelectric constant underneath the gate reduces the amount of threshold voltage shift that is caused by the mechanical stress. This thesis concludes that the H-induced piezoelectric [delta] V[sub]T can be significantly reduced by placing a non-expanding layer underneath the Ti-layer in the gate stack. Thinning the channel and insulator also helps mitigate the H-induced [delta] V[sub]T. by Samuel D. Mertens. Ph.D. 2014-05-23T19:32:40Z 2014-05-23T19:32:40Z 2003 2003 Thesis http://hdl.handle.net/1721.1/87453 54927314 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 125 p. application/pdf Massachusetts Institute of Technology
spellingShingle Electrical Engineering and Computer Science.
Mertens, Samuel D. (Samuel David), 1975-
The hydrogen-induced piezoelectric effect in InP HEMTs
title The hydrogen-induced piezoelectric effect in InP HEMTs
title_full The hydrogen-induced piezoelectric effect in InP HEMTs
title_fullStr The hydrogen-induced piezoelectric effect in InP HEMTs
title_full_unstemmed The hydrogen-induced piezoelectric effect in InP HEMTs
title_short The hydrogen-induced piezoelectric effect in InP HEMTs
title_sort hydrogen induced piezoelectric effect in inp hemts
topic Electrical Engineering and Computer Science.
url http://hdl.handle.net/1721.1/87453
work_keys_str_mv AT mertenssamueldsamueldavid1975 thehydrogeninducedpiezoelectriceffectininphemts
AT mertenssamueldsamueldavid1975 hydrogeninducedpiezoelectriceffectininphemts