Designing polymer surfaces via vapor deposition

Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface modification techniques for designing polymeric surfaces. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and...

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Main Authors: Asatekin, Ayse, Barr, Miles C., Baxamusa, Salmaan H., Lau, Kenneth K.S., Tenhaeff, Wyatt, Xu, Jingjing, Gleason, Karen K.
Other Authors: Massachusetts Institute of Technology. Department of Chemical Engineering
Format: Article
Language:en_US
Published: Elsevier 2014
Online Access:http://hdl.handle.net/1721.1/88187
https://orcid.org/0000-0001-6127-1056
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author Asatekin, Ayse
Barr, Miles C.
Baxamusa, Salmaan H.
Lau, Kenneth K.S.
Tenhaeff, Wyatt
Xu, Jingjing
Gleason, Karen K.
author2 Massachusetts Institute of Technology. Department of Chemical Engineering
author_facet Massachusetts Institute of Technology. Department of Chemical Engineering
Asatekin, Ayse
Barr, Miles C.
Baxamusa, Salmaan H.
Lau, Kenneth K.S.
Tenhaeff, Wyatt
Xu, Jingjing
Gleason, Karen K.
author_sort Asatekin, Ayse
collection MIT
description Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface modification techniques for designing polymeric surfaces. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. Since de-wetting and surface tension effects are absent, CVD coatings conform to the geometry of the underlying substrate. Hence, CVD polymers can be readily applied to virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. CVD methods integrate readily with other vacuum processes used to fabricate patterned surfaces and devices. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, thickness control, and the synthesis of films with graded composition. This article focuses on two CVD polymerization methods that closely translate solution chemistry to vapor deposition; initiated CVD and oxidative CVD. The basic concepts underlying these methods and the resultant advantages over other thin film coating techniques are described, along with selected applications where CVD polymers are an enabling technology.
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spelling mit-1721.1/881872022-09-29T10:50:51Z Designing polymer surfaces via vapor deposition Asatekin, Ayse Barr, Miles C. Baxamusa, Salmaan H. Lau, Kenneth K.S. Tenhaeff, Wyatt Xu, Jingjing Gleason, Karen K. Massachusetts Institute of Technology. Department of Chemical Engineering Asatekin, Ayse Barr, Miles C. Baxamusa, Salmaan H. Tenhaeff, Wyatt Xu, Jingjing Gleason, Karen K. Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface modification techniques for designing polymeric surfaces. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. Since de-wetting and surface tension effects are absent, CVD coatings conform to the geometry of the underlying substrate. Hence, CVD polymers can be readily applied to virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. CVD methods integrate readily with other vacuum processes used to fabricate patterned surfaces and devices. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, thickness control, and the synthesis of films with graded composition. This article focuses on two CVD polymerization methods that closely translate solution chemistry to vapor deposition; initiated CVD and oxidative CVD. The basic concepts underlying these methods and the resultant advantages over other thin film coating techniques are described, along with selected applications where CVD polymers are an enabling technology. Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Contract DAAD-19-02-D-0002) 2014-07-08T15:45:48Z 2014-07-08T15:45:48Z 2010-04 Article http://purl.org/eprint/type/JournalArticle 13697021 http://hdl.handle.net/1721.1/88187 Asatekin, Ayse, Miles C. Barr, Salmaan H. Baxamusa, Kenneth K.S. Lau, Wyatt Tenhaeff, Jingjing Xu, and Karen K. Gleason. “Designing Polymer Surfaces via Vapor Deposition.” Materials Today 13, no. 5 (May 2010): 26–33. © 2010 Elsevier Ltd. https://orcid.org/0000-0001-6127-1056 en_US http://dx.doi.org/10.1016/S1369-7021(10)70081-X Materials Today Creative Commons Attribution-NonCommercial-NoDerivs 3.0 http://creativecommons.org/licenses/by-nc-nd/3.0/ application/pdf Elsevier Elsevier
spellingShingle Asatekin, Ayse
Barr, Miles C.
Baxamusa, Salmaan H.
Lau, Kenneth K.S.
Tenhaeff, Wyatt
Xu, Jingjing
Gleason, Karen K.
Designing polymer surfaces via vapor deposition
title Designing polymer surfaces via vapor deposition
title_full Designing polymer surfaces via vapor deposition
title_fullStr Designing polymer surfaces via vapor deposition
title_full_unstemmed Designing polymer surfaces via vapor deposition
title_short Designing polymer surfaces via vapor deposition
title_sort designing polymer surfaces via vapor deposition
url http://hdl.handle.net/1721.1/88187
https://orcid.org/0000-0001-6127-1056
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