Designing polymer surfaces via vapor deposition
Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface modification techniques for designing polymeric surfaces. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and...
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Elsevier
2014
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Online Access: | http://hdl.handle.net/1721.1/88187 https://orcid.org/0000-0001-6127-1056 |
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author | Asatekin, Ayse Barr, Miles C. Baxamusa, Salmaan H. Lau, Kenneth K.S. Tenhaeff, Wyatt Xu, Jingjing Gleason, Karen K. |
author2 | Massachusetts Institute of Technology. Department of Chemical Engineering |
author_facet | Massachusetts Institute of Technology. Department of Chemical Engineering Asatekin, Ayse Barr, Miles C. Baxamusa, Salmaan H. Lau, Kenneth K.S. Tenhaeff, Wyatt Xu, Jingjing Gleason, Karen K. |
author_sort | Asatekin, Ayse |
collection | MIT |
description | Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface modification techniques for designing polymeric surfaces. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. Since de-wetting and surface tension effects are absent, CVD coatings conform to the geometry of the underlying substrate. Hence, CVD polymers can be readily applied to virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. CVD methods integrate readily with other vacuum processes used to fabricate patterned surfaces and devices. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, thickness control, and the synthesis of films with graded composition. This article focuses on two CVD polymerization methods that closely translate solution chemistry to vapor deposition; initiated CVD and oxidative CVD. The basic concepts underlying these methods and the resultant advantages over other thin film coating techniques are described, along with selected applications where CVD polymers are an enabling technology. |
first_indexed | 2024-09-23T14:50:06Z |
format | Article |
id | mit-1721.1/88187 |
institution | Massachusetts Institute of Technology |
language | en_US |
last_indexed | 2024-09-23T14:50:06Z |
publishDate | 2014 |
publisher | Elsevier |
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spelling | mit-1721.1/881872022-09-29T10:50:51Z Designing polymer surfaces via vapor deposition Asatekin, Ayse Barr, Miles C. Baxamusa, Salmaan H. Lau, Kenneth K.S. Tenhaeff, Wyatt Xu, Jingjing Gleason, Karen K. Massachusetts Institute of Technology. Department of Chemical Engineering Asatekin, Ayse Barr, Miles C. Baxamusa, Salmaan H. Tenhaeff, Wyatt Xu, Jingjing Gleason, Karen K. Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface modification techniques for designing polymeric surfaces. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. Since de-wetting and surface tension effects are absent, CVD coatings conform to the geometry of the underlying substrate. Hence, CVD polymers can be readily applied to virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. CVD methods integrate readily with other vacuum processes used to fabricate patterned surfaces and devices. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, thickness control, and the synthesis of films with graded composition. This article focuses on two CVD polymerization methods that closely translate solution chemistry to vapor deposition; initiated CVD and oxidative CVD. The basic concepts underlying these methods and the resultant advantages over other thin film coating techniques are described, along with selected applications where CVD polymers are an enabling technology. Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Contract DAAD-19-02-D-0002) 2014-07-08T15:45:48Z 2014-07-08T15:45:48Z 2010-04 Article http://purl.org/eprint/type/JournalArticle 13697021 http://hdl.handle.net/1721.1/88187 Asatekin, Ayse, Miles C. Barr, Salmaan H. Baxamusa, Kenneth K.S. Lau, Wyatt Tenhaeff, Jingjing Xu, and Karen K. Gleason. “Designing Polymer Surfaces via Vapor Deposition.” Materials Today 13, no. 5 (May 2010): 26–33. © 2010 Elsevier Ltd. https://orcid.org/0000-0001-6127-1056 en_US http://dx.doi.org/10.1016/S1369-7021(10)70081-X Materials Today Creative Commons Attribution-NonCommercial-NoDerivs 3.0 http://creativecommons.org/licenses/by-nc-nd/3.0/ application/pdf Elsevier Elsevier |
spellingShingle | Asatekin, Ayse Barr, Miles C. Baxamusa, Salmaan H. Lau, Kenneth K.S. Tenhaeff, Wyatt Xu, Jingjing Gleason, Karen K. Designing polymer surfaces via vapor deposition |
title | Designing polymer surfaces via vapor deposition |
title_full | Designing polymer surfaces via vapor deposition |
title_fullStr | Designing polymer surfaces via vapor deposition |
title_full_unstemmed | Designing polymer surfaces via vapor deposition |
title_short | Designing polymer surfaces via vapor deposition |
title_sort | designing polymer surfaces via vapor deposition |
url | http://hdl.handle.net/1721.1/88187 https://orcid.org/0000-0001-6127-1056 |
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