Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors

We report on studies of degradation mechanisms of tetraphenyl butadiene (TPB) coatings of the type used in neutrino and dark matter liquid argon experiments. Using gas chromatography coupled to mass spectrometry we have detected the ultraviolet-blocking impurity benzophenone. We monitored the drop i...

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Main Authors: Jones, Benjamin James Poyner, VanGemert, J. K., Conrad, Janet, Pla-Dalmau, A.
Other Authors: Massachusetts Institute of Technology. Department of Physics
Format: Article
Language:en_US
Published: Institute of Physics Publishing 2014
Online Access:http://hdl.handle.net/1721.1/88282
https://orcid.org/0000-0002-6393-0438
https://orcid.org/0000-0001-6243-1453
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author Jones, Benjamin James Poyner
VanGemert, J. K.
Conrad, Janet
Pla-Dalmau, A.
author2 Massachusetts Institute of Technology. Department of Physics
author_facet Massachusetts Institute of Technology. Department of Physics
Jones, Benjamin James Poyner
VanGemert, J. K.
Conrad, Janet
Pla-Dalmau, A.
author_sort Jones, Benjamin James Poyner
collection MIT
description We report on studies of degradation mechanisms of tetraphenyl butadiene (TPB) coatings of the type used in neutrino and dark matter liquid argon experiments. Using gas chromatography coupled to mass spectrometry we have detected the ultraviolet-blocking impurity benzophenone. We monitored the drop in performance and increase of benzophenone concentration in TPB plates with exposure to ultraviolet (UV) light, and demonstrate the correlation between these two variables. Based on the presence and initially exponential increase in the concentration of benzophenone observed, we propose that TPB degradation is a free radical-mediated photooxidation reaction, which is subsequently confirmed by displaying delayed degradation using a free radical inhibitor. Finally we show that the performance of wavelength-shifting coatings of the type envisioned for the LBNE experiment can be improved by 10-20%, with significantly delayed UV degradation, by using a 20% admixture of 4-tert-Butylcatechol.
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spelling mit-1721.1/882822022-10-01T00:09:38Z Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors Jones, Benjamin James Poyner VanGemert, J. K. Conrad, Janet Pla-Dalmau, A. Massachusetts Institute of Technology. Department of Physics Jones, Benjamin James Poyner Conrad, Janet We report on studies of degradation mechanisms of tetraphenyl butadiene (TPB) coatings of the type used in neutrino and dark matter liquid argon experiments. Using gas chromatography coupled to mass spectrometry we have detected the ultraviolet-blocking impurity benzophenone. We monitored the drop in performance and increase of benzophenone concentration in TPB plates with exposure to ultraviolet (UV) light, and demonstrate the correlation between these two variables. Based on the presence and initially exponential increase in the concentration of benzophenone observed, we propose that TPB degradation is a free radical-mediated photooxidation reaction, which is subsequently confirmed by displaying delayed degradation using a free radical inhibitor. Finally we show that the performance of wavelength-shifting coatings of the type envisioned for the LBNE experiment can be improved by 10-20%, with significantly delayed UV degradation, by using a 20% admixture of 4-tert-Butylcatechol. National Science Foundation (U.S.) (NSF-PHY-084784) United States. Dept. of Energy (DE-FG02-91ER40661) 2014-07-11T17:42:27Z 2014-07-11T17:42:27Z 2013-01 2012-12 Article http://purl.org/eprint/type/JournalArticle 1748-0221 http://hdl.handle.net/1721.1/88282 Jones, B J P, J K VanGemert, J M Conrad, and A Pla-Dalmau. “Photodegradation Mechanisms of Tetraphenyl Butadiene Coatings for Liquid Argon Detectors.” Journal of Instrumentation 8, no. 01 (January 23, 2013): P01013–P01013. https://orcid.org/0000-0002-6393-0438 https://orcid.org/0000-0001-6243-1453 en_US http://dx.doi.org/10.1088/1748-0221/8/01/p01013 Journal of Instrumentation Creative Commons Attribution-Noncommercial-Share Alike http://creativecommons.org/licenses/by-nc-sa/4.0/ application/pdf Institute of Physics Publishing arXiv
spellingShingle Jones, Benjamin James Poyner
VanGemert, J. K.
Conrad, Janet
Pla-Dalmau, A.
Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors
title Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors
title_full Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors
title_fullStr Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors
title_full_unstemmed Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors
title_short Photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors
title_sort photodegradation mechanisms of tetraphenyl butadiene coatings for liquid argon detectors
url http://hdl.handle.net/1721.1/88282
https://orcid.org/0000-0002-6393-0438
https://orcid.org/0000-0001-6243-1453
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