Nanometer-scale placement in electron-beam lithography

Nanometer-scale placement in electron-beam lithography

Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000.

Bibliographic Details
Main Author: Ferrera, Juan (Ferrera Uranga)
Other Authors: Henry I. Smith.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2005
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/9117

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