Incorporation of Fe into NiSi[subscript 2] precipitates
The present paper provides evidence that Fe can be incorporated into NiSi[subscript 2] precipitates by solid-state diffusion. Furthermore, analysis of Si crystals contaminated with Ni and Fe at 1100°C and post annealed at 600°C and 800°C for 20–240 min revealed a strong indication that this incorpor...
Glavni autori: | Langkau, S., Wagner, G., Bertoni, Mariana I., Kloess, G., Buonassisi, Tonio |
---|---|
Daljnji autori: | Massachusetts Institute of Technology. Department of Mechanical Engineering |
Format: | Članak |
Jezik: | en_US |
Izdano: |
Elsevier
2014
|
Online pristup: | http://hdl.handle.net/1721.1/92557 https://orcid.org/0000-0001-8345-4937 |
Slični predmeti
-
Improved NiSi salicide process using presilicide N2+ implant for MOSFETs
od: Wee, A. T. S., i dr.
Izdano: (2012) -
A self-rectifying HfOx-based unipolar RRAM with NiSi electrode
od: Tran, Xuan Anh, i dr.
Izdano: (2013) -
Growth and structural property studies on NiSi/SiC core-shell nanowires by hot-wire chemical vapor deposition
od: Nazarudin, N.F.F., i dr.
Izdano: (2014) -
Physical, optical and electrical studies on hybrid Ag NPs/NiSi NWs electrode as a DNA template for biosensor
od: Nazarudin, Nur Fatin Farhanah, i dr.
Izdano: (2019) -
Bimetallic Fe-Ni/SiO2 catalysts for furfural hydrogenation: Identification of the interplay between Fe and Ni during deposition-precipitation and thermal treatments
od: Shi, D, i dr.
Izdano: (2018)