Nested potassium hydroxide etching and protective coatings for silicon-based microreactors
We have developed a multilayer, multichannel silicon-based microreactor that uses elemental fluorine as a reagent and generates hydrogen fluoride as a byproduct. Nested potassium hydroxide etching (using silicon nitride and silicon oxide as masking materials) was developed to create a large number o...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
IOP Publishing
2015
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| Online Access: | http://hdl.handle.net/1721.1/92780 https://orcid.org/0000-0001-7192-580X https://orcid.org/0000-0001-7322-7490 |