Concepts for tokamak plasma as an X-ray sources for lithography and other applications
| Main Authors: | , , |
|---|---|
| Published: |
MIT Plasma Science and Fusion Center
2015
|
| Online Access: | http://hdl.handle.net/1721.1/93590 |
| _version_ | 1811097459676413952 |
|---|---|
| author | Bromberg, L. Petrasso, R. Cohn, D.R. |
| author_facet | Bromberg, L. Petrasso, R. Cohn, D.R. |
| author_sort | Bromberg, L. |
| collection | MIT |
| first_indexed | 2024-09-23T16:59:52Z |
| id | mit-1721.1/93590 |
| institution | Massachusetts Institute of Technology |
| last_indexed | 2024-09-23T16:59:52Z |
| publishDate | 2015 |
| publisher | MIT Plasma Science and Fusion Center |
| record_format | dspace |
| spelling | mit-1721.1/935902019-04-10T07:48:43Z Concepts for tokamak plasma as an X-ray sources for lithography and other applications Bromberg, L. Petrasso, R. Cohn, D.R. 2015-02-03T02:17:13Z 2015-02-03T02:17:13Z 1987-01-01 87rr019 http://hdl.handle.net/1721.1/93590 application/pdf MIT Plasma Science and Fusion Center |
| spellingShingle | Bromberg, L. Petrasso, R. Cohn, D.R. Concepts for tokamak plasma as an X-ray sources for lithography and other applications |
| title | Concepts for tokamak plasma as an X-ray sources for lithography and other applications |
| title_full | Concepts for tokamak plasma as an X-ray sources for lithography and other applications |
| title_fullStr | Concepts for tokamak plasma as an X-ray sources for lithography and other applications |
| title_full_unstemmed | Concepts for tokamak plasma as an X-ray sources for lithography and other applications |
| title_short | Concepts for tokamak plasma as an X-ray sources for lithography and other applications |
| title_sort | concepts for tokamak plasma as an x ray sources for lithography and other applications |
| url | http://hdl.handle.net/1721.1/93590 |
| work_keys_str_mv | AT brombergl conceptsfortokamakplasmaasanxraysourcesforlithographyandotherapplications AT petrassor conceptsfortokamakplasmaasanxraysourcesforlithographyandotherapplications AT cohndr conceptsfortokamakplasmaasanxraysourcesforlithographyandotherapplications |