A next-generation in-situ nanoprobe beamline for the Advanced Photon Source
The Advanced Photon Source is currently developing a suite of new hard x-ray beamlines, aimed primarily at the study of materials and devices under real conditions. One of the flagship beamlines of the APS Upgrade is the In-Situ Nanoprobe beamline (ISN beamline), which will provide in-situ and opera...
| Main Authors: | , , , , , , , , , , , , , , , , |
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| Format: | Article |
| Language: | en_US |
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SPIE
2015
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| Online Access: | http://hdl.handle.net/1721.1/97233 https://orcid.org/0000-0001-8345-4937 |
| _version_ | 1811095248363847680 |
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| author | Maser, Jorg Lai, Barry Buonassisi, Tonio Cai, Zhonghou Chen, Si Finney, Lydia Gleber, Sophie-Charlotte Harder, Ross Jacobsen, Chris Liu, Wenjun Murray, Conal Preissner, Curt Roehrig, Chris Rose, Volker Shu, Deming Vine, David Vogt, Stefan |
| author2 | Massachusetts Institute of Technology. Department of Mechanical Engineering |
| author_facet | Massachusetts Institute of Technology. Department of Mechanical Engineering Maser, Jorg Lai, Barry Buonassisi, Tonio Cai, Zhonghou Chen, Si Finney, Lydia Gleber, Sophie-Charlotte Harder, Ross Jacobsen, Chris Liu, Wenjun Murray, Conal Preissner, Curt Roehrig, Chris Rose, Volker Shu, Deming Vine, David Vogt, Stefan |
| author_sort | Maser, Jorg |
| collection | MIT |
| description | The Advanced Photon Source is currently developing a suite of new hard x-ray beamlines, aimed primarily at the study of materials and devices under real conditions. One of the flagship beamlines of the APS Upgrade is the In-Situ Nanoprobe beamline (ISN beamline), which will provide in-situ and operando characterization of advanced energy materials and devices under change of temperature and gases, under applied fields, in 3D. The ISN beamline is designed to deliver spatially coherent x-rays with photon energies between 4 keV and 30 keV to the ISN instrument. As an x-ray source, a revolver-type undulator with two interchangeable magnetic structures, optimized to provide high brilliance throughout the range of photon energies of 4 keV – 30 keV, will be used. The ISN instrument will provide a smallest hard x-ray spot of 20 nm using diffractive optics, with sensitivity to sub-10 nm sample structures using coherent diffraction. Using nanofocusing mirrors in Kirkpatrick-Baez geometry, the ISN will also provide a focus of 50 nm with a flux of 8·1011 Photons/s at a photon energy of 10 keV, several orders of magnitude larger than what is currently available. This will allow imaging of trace amounts of most elements in the periodic table, with a sensitivity to well below 100 atoms for most metals in thin samples. It will also enable nanospectroscopic studies of the chemical state of most materials relevant to energy science. The ISN beamline will be primarily used to study inorganic and organic photovoltaic systems, advanced batteries and fuel cells, nanoelectronics devices, and materials and systems diesigned to reduce the environmental impact of combustion. |
| first_indexed | 2024-09-23T16:13:58Z |
| format | Article |
| id | mit-1721.1/97233 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T16:13:58Z |
| publishDate | 2015 |
| publisher | SPIE |
| record_format | dspace |
| spelling | mit-1721.1/972332022-10-02T07:09:06Z A next-generation in-situ nanoprobe beamline for the Advanced Photon Source Maser, Jorg Lai, Barry Buonassisi, Tonio Cai, Zhonghou Chen, Si Finney, Lydia Gleber, Sophie-Charlotte Harder, Ross Jacobsen, Chris Liu, Wenjun Murray, Conal Preissner, Curt Roehrig, Chris Rose, Volker Shu, Deming Vine, David Vogt, Stefan Massachusetts Institute of Technology. Department of Mechanical Engineering Buonassisi, Tonio The Advanced Photon Source is currently developing a suite of new hard x-ray beamlines, aimed primarily at the study of materials and devices under real conditions. One of the flagship beamlines of the APS Upgrade is the In-Situ Nanoprobe beamline (ISN beamline), which will provide in-situ and operando characterization of advanced energy materials and devices under change of temperature and gases, under applied fields, in 3D. The ISN beamline is designed to deliver spatially coherent x-rays with photon energies between 4 keV and 30 keV to the ISN instrument. As an x-ray source, a revolver-type undulator with two interchangeable magnetic structures, optimized to provide high brilliance throughout the range of photon energies of 4 keV – 30 keV, will be used. The ISN instrument will provide a smallest hard x-ray spot of 20 nm using diffractive optics, with sensitivity to sub-10 nm sample structures using coherent diffraction. Using nanofocusing mirrors in Kirkpatrick-Baez geometry, the ISN will also provide a focus of 50 nm with a flux of 8·1011 Photons/s at a photon energy of 10 keV, several orders of magnitude larger than what is currently available. This will allow imaging of trace amounts of most elements in the periodic table, with a sensitivity to well below 100 atoms for most metals in thin samples. It will also enable nanospectroscopic studies of the chemical state of most materials relevant to energy science. The ISN beamline will be primarily used to study inorganic and organic photovoltaic systems, advanced batteries and fuel cells, nanoelectronics devices, and materials and systems diesigned to reduce the environmental impact of combustion. United States. Dept. of Energy (SunShot Initiative Contract DE-EE0005314) United States. Dept. of Energy (SunShot Initiative Contract DE-EE0005329) United States. Dept. of Energy (SunShot Initiative Contract DE-EE0005948) 2015-06-09T13:30:55Z 2015-06-09T13:30:55Z 2013-09 Article http://purl.org/eprint/type/ConferencePaper 0277-786X http://hdl.handle.net/1721.1/97233 Maser, Jorg, Barry Lai, Tonio Buonassisi, Zhonghou Cai, Si Chen, Lydia Finney, Sophie-Charlotte Gleber, et al. “A Next-Generation in-Situ Nanoprobe Beamline for the Advanced Photon Source.” Edited by Barry Lai. X-Ray Nanoimaging: Instruments and Methods (September 26, 2013). © 2013 Society of Photo-Optical Instrumentation Engineers (SPIE) https://orcid.org/0000-0001-8345-4937 en_US http://dx.doi.org/10.1117/12.2026418 Proceedings of SPIE--the International Society for Optical Engineering Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf SPIE SPIE |
| spellingShingle | Maser, Jorg Lai, Barry Buonassisi, Tonio Cai, Zhonghou Chen, Si Finney, Lydia Gleber, Sophie-Charlotte Harder, Ross Jacobsen, Chris Liu, Wenjun Murray, Conal Preissner, Curt Roehrig, Chris Rose, Volker Shu, Deming Vine, David Vogt, Stefan A next-generation in-situ nanoprobe beamline for the Advanced Photon Source |
| title | A next-generation in-situ nanoprobe beamline for the Advanced Photon Source |
| title_full | A next-generation in-situ nanoprobe beamline for the Advanced Photon Source |
| title_fullStr | A next-generation in-situ nanoprobe beamline for the Advanced Photon Source |
| title_full_unstemmed | A next-generation in-situ nanoprobe beamline for the Advanced Photon Source |
| title_short | A next-generation in-situ nanoprobe beamline for the Advanced Photon Source |
| title_sort | next generation in situ nanoprobe beamline for the advanced photon source |
| url | http://hdl.handle.net/1721.1/97233 https://orcid.org/0000-0001-8345-4937 |
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