Influence of substrate heating on hole geometry and spatter area in femtosecond laser drilling of silicon
The objective of this research is to evaluate the effects of the hole geometry and the spatter area around the drilled hole by femtosecond laser deep drilling on silicon with various temperatures. Deep through holes were produced on single crystal silicon wafer femtosecond laser at elevated temperat...
Main Authors: | , , , , |
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Other Authors: | |
Format: | Journal Article |
Language: | English |
Published: |
2014
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/100052 http://hdl.handle.net/10220/19579 |