Visualizing charge transport in silicon nanocrystals embedded in SiO2 films with electrostatic force microscopy

In this work, we report a mapping of charge transport in silicon nanocrystals (nc-Si) embedded in SiO2 dielectric films with electrostatic force microscopy. The charge diffusion from chargednc-Si to neighboring uncharged nc-Si in the SiO2 matrix is found to be the dominant mechanism for the decay of...

पूर्ण विवरण

ग्रंथसूची विवरण
मुख्य लेखकों: Lau, Hon Wu, Ng, Chi Yung, Liu, Yang, Tse, Man Siu, Lim, Vanissa Sei Wei, Tan, Ooi Kiang, Chen, Tupei
अन्य लेखक: School of Electrical and Electronic Engineering
स्वरूप: Journal Article
भाषा:English
प्रकाशित: 2010
विषय:
ऑनलाइन पहुंच:https://hdl.handle.net/10356/101362
http://hdl.handle.net/10220/6414
विवरण
सारांश:In this work, we report a mapping of charge transport in silicon nanocrystals (nc-Si) embedded in SiO2 dielectric films with electrostatic force microscopy. The charge diffusion from chargednc-Si to neighboring uncharged nc-Si in the SiO2 matrix is found to be the dominant mechanism for the decay of the trapped charge in the nc-Si. The trapped charge and the charge decay have been determined quantitatively from the electrical force measurement. An increase in the area of the charge cloud due to the charge diffusion has been observed clearly. In addition, the blockage and acceleration of charge diffusion by the neighboring charges with the same and opposite charge signs (i.e., positive or negative), respectively, have been observed.