OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with...
| Main Authors: | , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/101437 http://hdl.handle.net/10220/11110 |
| _version_ | 1826120649489252352 |
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| author | Zhou, Xiaozhu Shade, Chad M. Schmucker, Abrin L. Brown, Keith A. He, Shu Boey, Freddy Yin Chiang Ma, Jan Zhang, Hua Mirkin, Chad A. |
| author2 | School of Materials Science & Engineering |
| author_facet | School of Materials Science & Engineering Zhou, Xiaozhu Shade, Chad M. Schmucker, Abrin L. Brown, Keith A. He, Shu Boey, Freddy Yin Chiang Ma, Jan Zhang, Hua Mirkin, Chad A. |
| author_sort | Zhou, Xiaozhu |
| collection | NTU |
| description | We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with Au and Ni segments on a graphene-coated substrate, chemically etching the Ni segments, and using a reactive ion etch to remove the graphene not protected by the remaining Au segments. Graphene nanoribbons with gaps as small as 6 nm are fabricated and characterized with atomic force microscopy, scanning electron microscopy, and Raman spectroscopy. The high level of control afforded by electrochemical synthesis of the nanowires allows us to specify the dimensions of the nanoribbon, as well as the number, location, and size of nanogaps within the nanoribbon. In addition, the generality of this technique is demonstrated by creating silicon nanostructures with nanogaps. |
| first_indexed | 2024-10-01T05:19:54Z |
| format | Journal Article |
| id | ntu-10356/101437 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T05:19:54Z |
| publishDate | 2013 |
| record_format | dspace |
| spelling | ntu-10356/1014372020-06-01T10:21:15Z OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps Zhou, Xiaozhu Shade, Chad M. Schmucker, Abrin L. Brown, Keith A. He, Shu Boey, Freddy Yin Chiang Ma, Jan Zhang, Hua Mirkin, Chad A. School of Materials Science & Engineering We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with Au and Ni segments on a graphene-coated substrate, chemically etching the Ni segments, and using a reactive ion etch to remove the graphene not protected by the remaining Au segments. Graphene nanoribbons with gaps as small as 6 nm are fabricated and characterized with atomic force microscopy, scanning electron microscopy, and Raman spectroscopy. The high level of control afforded by electrochemical synthesis of the nanowires allows us to specify the dimensions of the nanoribbon, as well as the number, location, and size of nanogaps within the nanoribbon. In addition, the generality of this technique is demonstrated by creating silicon nanostructures with nanogaps. 2013-07-10T06:31:59Z 2019-12-06T20:38:44Z 2013-07-10T06:31:59Z 2019-12-06T20:38:44Z 2012 2012 Journal Article Zhou, X., Shade, C. M., Schmucker, A. L., Brown, K. A., He, S., Boey, F., et al. (2012). OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps. Nano Letters, 12(9), 4734-4737. https://hdl.handle.net/10356/101437 http://hdl.handle.net/10220/11110 10.1021/nl302171z en Nano letters © 2012 American Chemical Society. |
| spellingShingle | Zhou, Xiaozhu Shade, Chad M. Schmucker, Abrin L. Brown, Keith A. He, Shu Boey, Freddy Yin Chiang Ma, Jan Zhang, Hua Mirkin, Chad A. OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps |
| title | OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps |
| title_full | OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps |
| title_fullStr | OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps |
| title_full_unstemmed | OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps |
| title_short | OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps |
| title_sort | owl based nanomasks for preparing graphene ribbons with sub 10 nm gaps |
| url | https://hdl.handle.net/10356/101437 http://hdl.handle.net/10220/11110 |
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