OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps

OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps

We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with...

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Bibliographic Details
Main Authors: Zhou, Xiaozhu, Shade, Chad M., Schmucker, Abrin L., Brown, Keith A., He, Shu, Boey, Freddy Yin Chiang, Ma, Jan, Zhang, Hua, Mirkin, Chad A.
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/101437
http://hdl.handle.net/10220/11110

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