Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser

Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative textu...

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Main Authors: Farrokhi, Hamid, Zhou, Wei, Zheng, Hongyu, Li, Zhongli
Other Authors: School of Mechanical and Aerospace Engineering
Format: Journal Article
Language:English
Published: 2014
Subjects:
Online Access:https://hdl.handle.net/10356/102867
http://hdl.handle.net/10220/19209
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author Farrokhi, Hamid
Zhou, Wei
Zheng, Hongyu
Li, Zhongli
author2 School of Mechanical and Aerospace Engineering
author_facet School of Mechanical and Aerospace Engineering
Farrokhi, Hamid
Zhou, Wei
Zheng, Hongyu
Li, Zhongli
author_sort Farrokhi, Hamid
collection NTU
description Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative texturing of Si surface is possible if suitable laser power and dwell time are used to produce peak temperatures above 1250 K and below the Si melting point of 1690 K. Localized oxidation occurs in the temperature range and results in formation of regularly patterned bumps.
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spelling ntu-10356/1028672020-03-07T13:19:20Z Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser Farrokhi, Hamid Zhou, Wei Zheng, Hongyu Li, Zhongli School of Mechanical and Aerospace Engineering DRNTU::Engineering::Mechanical engineering Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative texturing of Si surface is possible if suitable laser power and dwell time are used to produce peak temperatures above 1250 K and below the Si melting point of 1690 K. Localized oxidation occurs in the temperature range and results in formation of regularly patterned bumps. 2014-04-10T03:22:27Z 2019-12-06T21:01:19Z 2014-04-10T03:22:27Z 2019-12-06T21:01:19Z 2014 2014 Journal Article Farrokhi, H., Zhou, W., Zheng, H., & Li, Z. (2014). Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser. Journal of Computational and Theoretical Nanoscience, 11(1), 53-57. https://hdl.handle.net/10356/102867 http://hdl.handle.net/10220/19209 10.1166/jctn.2014.3316 en Journal of computational and theoretical nanoscience © 2014 American Scientific Publishers.
spellingShingle DRNTU::Engineering::Mechanical engineering
Farrokhi, Hamid
Zhou, Wei
Zheng, Hongyu
Li, Zhongli
Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
title Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
title_full Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
title_fullStr Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
title_full_unstemmed Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
title_short Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
title_sort numerical simulation of non ablative laser texturing of silicon surface with a continuous wave fiber laser
topic DRNTU::Engineering::Mechanical engineering
url https://hdl.handle.net/10356/102867
http://hdl.handle.net/10220/19209
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