Property study of aluminium oxide thin films by thermal annealing
Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under the oxygen partial pressure of 5 × 10-4 Torr at room temperature. Annealing effects on the properties of the films between 200 °C and 900 °C were investigated. Experiments results showed that the surf...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
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2013
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/105232 http://hdl.handle.net/10220/16801 http://dx.doi.org/10.1002/pssc.201084181 |
| _version_ | 1811687827601096704 |
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| author | Zhao, Zhiwei Tay, Beng Kang |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Zhao, Zhiwei Tay, Beng Kang |
| author_sort | Zhao, Zhiwei |
| collection | NTU |
| description | Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under the oxygen partial pressure of 5 × 10-4 Torr at room temperature. Annealing effects on the properties of the films between 200 °C and 900 °C were investigated. Experiments results showed that the surfaces of aluminium oxide thin films remained smooth up to 600 °C. Crystallization is induced for the film annealed at 900 °C. It was also found that refractive index of the films increased with increasing the annealing temperature. Strong frequency dispersion of refractive index was found and fitted to a single oscillator model. The dispersion parameters, such as single oscillator energy, dispersion energy, average oscillator strength and its related wavelength, were estimated. |
| first_indexed | 2024-10-01T05:22:30Z |
| format | Journal Article |
| id | ntu-10356/105232 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T05:22:30Z |
| publishDate | 2013 |
| record_format | dspace |
| spelling | ntu-10356/1052322019-12-06T21:47:46Z Property study of aluminium oxide thin films by thermal annealing Zhao, Zhiwei Tay, Beng Kang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under the oxygen partial pressure of 5 × 10-4 Torr at room temperature. Annealing effects on the properties of the films between 200 °C and 900 °C were investigated. Experiments results showed that the surfaces of aluminium oxide thin films remained smooth up to 600 °C. Crystallization is induced for the film annealed at 900 °C. It was also found that refractive index of the films increased with increasing the annealing temperature. Strong frequency dispersion of refractive index was found and fitted to a single oscillator model. The dispersion parameters, such as single oscillator energy, dispersion energy, average oscillator strength and its related wavelength, were estimated. 2013-10-24T07:42:04Z 2019-12-06T21:47:46Z 2013-10-24T07:42:04Z 2019-12-06T21:47:46Z 2011 2011 Journal Article Zhao, Z., & Tay, B. K. (2012). Property study of aluminium oxide thin films by thermal annealing. physica status solidi (c), 9(1), 77-80. 1862-6351 https://hdl.handle.net/10356/105232 http://hdl.handle.net/10220/16801 http://dx.doi.org/10.1002/pssc.201084181 en physica status solidi (c) |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering Zhao, Zhiwei Tay, Beng Kang Property study of aluminium oxide thin films by thermal annealing |
| title | Property study of aluminium oxide thin films by thermal annealing |
| title_full | Property study of aluminium oxide thin films by thermal annealing |
| title_fullStr | Property study of aluminium oxide thin films by thermal annealing |
| title_full_unstemmed | Property study of aluminium oxide thin films by thermal annealing |
| title_short | Property study of aluminium oxide thin films by thermal annealing |
| title_sort | property study of aluminium oxide thin films by thermal annealing |
| topic | DRNTU::Engineering::Electrical and electronic engineering |
| url | https://hdl.handle.net/10356/105232 http://hdl.handle.net/10220/16801 http://dx.doi.org/10.1002/pssc.201084181 |
| work_keys_str_mv | AT zhaozhiwei propertystudyofaluminiumoxidethinfilmsbythermalannealing AT taybengkang propertystudyofaluminiumoxidethinfilmsbythermalannealing |