Property study of aluminium oxide thin films by thermal annealing
Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under the oxygen partial pressure of 5 × 10-4 Torr at room temperature. Annealing effects on the properties of the films between 200 °C and 900 °C were investigated. Experiments results showed that the surf...
Main Authors: | Zhao, Zhiwei, Tay, Beng Kang |
---|---|
Other Authors: | School of Electrical and Electronic Engineering |
Format: | Journal Article |
Language: | English |
Published: |
2013
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/105232 http://hdl.handle.net/10220/16801 http://dx.doi.org/10.1002/pssc.201084181 |
Similar Items
-
Study of nanocluster-assembled ZnO thin films by nanocluster-beam deposition
by: Zhao, Zhiwei, et al.
Published: (2013) -
Electrical properties of textured carbon film formed by pulsed laser annealing
by: Xu, Naiyun, et al.
Published: (2013) -
Electronic properties of tetrahedral amorphous carbon thin films deposited by filtered cathodic vacuum arc technique
by: Tay, Beng Kang
Published: (2008) -
Fabrication and characterization of thin film novel materials for microdevices and microsystems
by: Tay, Beng Kang
Published: (2008) -
Gold nano particles for nanowire growth formed by thin film thermal annealing process
by: Aung, Nyein Chan
Published: (2010)