Characterisation of amorphous carbon films deposited using ECR-CVD
Hydrogenated diamond-like carbon (DLC) films have received a considerable amount of interest recently due to their unique characteristics such as chemical stability, mechanical hardness and high optical transparency. Among different deposition methods, the electron cyclotron resonance chemical vapou...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Language: | English |
| Published: |
2008
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10356/13268 |
| _version_ | 1826115616217497600 |
|---|---|
| author | Wu, Yangsheng. |
| author2 | Yoon, Soon Fatt |
| author_facet | Yoon, Soon Fatt Wu, Yangsheng. |
| author_sort | Wu, Yangsheng. |
| collection | NTU |
| description | Hydrogenated diamond-like carbon (DLC) films have received a considerable amount of interest recently due to their unique characteristics such as chemical stability, mechanical hardness and high optical transparency. Among different deposition methods, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been increasingly used for the growth of DLC films due to its capable of producing a highly excited plasma with greater efficiency in the breaking of the C-H bonds in the reactant gas mixture. |
| first_indexed | 2024-10-01T03:58:04Z |
| format | Thesis |
| id | ntu-10356/13268 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T03:58:04Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/132682023-07-04T15:30:05Z Characterisation of amorphous carbon films deposited using ECR-CVD Wu, Yangsheng. Yoon, Soon Fatt School of Electrical and Electronic Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials Hydrogenated diamond-like carbon (DLC) films have received a considerable amount of interest recently due to their unique characteristics such as chemical stability, mechanical hardness and high optical transparency. Among different deposition methods, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been increasingly used for the growth of DLC films due to its capable of producing a highly excited plasma with greater efficiency in the breaking of the C-H bonds in the reactant gas mixture. Master of Engineering 2008-10-20T07:22:22Z 2008-10-20T07:22:22Z 1999 1999 Thesis http://hdl.handle.net/10356/13268 en 98 p. application/pdf |
| spellingShingle | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials Wu, Yangsheng. Characterisation of amorphous carbon films deposited using ECR-CVD |
| title | Characterisation of amorphous carbon films deposited using ECR-CVD |
| title_full | Characterisation of amorphous carbon films deposited using ECR-CVD |
| title_fullStr | Characterisation of amorphous carbon films deposited using ECR-CVD |
| title_full_unstemmed | Characterisation of amorphous carbon films deposited using ECR-CVD |
| title_short | Characterisation of amorphous carbon films deposited using ECR-CVD |
| title_sort | characterisation of amorphous carbon films deposited using ecr cvd |
| topic | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials |
| url | http://hdl.handle.net/10356/13268 |
| work_keys_str_mv | AT wuyangsheng characterisationofamorphouscarbonfilmsdepositedusingecrcvd |