Cu-Cu bonding in ambient environment by Ar/N 2 plasma surface activation and its characterization
Ar/N 2 plasma surface activation in ambient environment for Cu-Cu bonding has been performed and characterized. Cu-Cu bonding occurs at room temperature and under normal atmospheric conditions. Postbonding annealing is performed at 300 °C and below to control the overall thermal budget. Shear streng...
Main Authors: | Chua, Shen Lin, Chan, Marvin Jiawei, Goh, Simon Chun Kiat, Tan, Chuan Seng |
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Other Authors: | School of Electrical and Electronic Engineering |
Format: | Journal Article |
Language: | English |
Published: |
2020
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/143486 |
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