Pulsed laser annealed silicides formation for advanced MOS applications
The aim of this work is to investigate the laser-induced silicide and germanosilicide formation in detail. Three main aspects, which affect the laser-induced silicide or germanosilicide formation, will be evaluated. First of them is the effect of laser fluence and number of laser pulses. These direc...
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Format: | Thesis |
Language: | English |
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2009
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Online Access: | http://hdl.handle.net/10356/14847 |