Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices
We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide...
| Main Authors: | , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2021
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/148729 |
| _version_ | 1826123900394668032 |
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| author | Oo, Swe Z. Tarazona, Antulio Khokhar, Ali Z. Petra, Rafidah Franz, Yohann Mashanovich, Goran Z. Reed, Graham T. Peacock, Anna C. Chong, Harold M. H. |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Oo, Swe Z. Tarazona, Antulio Khokhar, Ali Z. Petra, Rafidah Franz, Yohann Mashanovich, Goran Z. Reed, Graham T. Peacock, Anna C. Chong, Harold M. H. |
| author_sort | Oo, Swe Z. |
| collection | NTU |
| description | We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide deposited at 230°C that has a strong Raman peak shift at 480 cm , peak width (full width at half-maximum) of 68.9 cm , and bond angle deviation of 8.98°. Optical transmission measurement shows a low propagation loss of 0.8 dB/cm at the 1550 nm wavelength, which is the first, to our knowledge, report for a HWCVD a-Si:H waveguide. |
| first_indexed | 2024-10-01T06:11:54Z |
| format | Journal Article |
| id | ntu-10356/148729 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T06:11:54Z |
| publishDate | 2021 |
| record_format | dspace |
| spelling | ntu-10356/1487292021-05-05T07:41:33Z Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices Oo, Swe Z. Tarazona, Antulio Khokhar, Ali Z. Petra, Rafidah Franz, Yohann Mashanovich, Goran Z. Reed, Graham T. Peacock, Anna C. Chong, Harold M. H. School of Electrical and Electronic Engineering Engineering::Electrical and electronic engineering Microcrystalline Silicon Films We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide deposited at 230°C that has a strong Raman peak shift at 480 cm , peak width (full width at half-maximum) of 68.9 cm , and bond angle deviation of 8.98°. Optical transmission measurement shows a low propagation loss of 0.8 dB/cm at the 1550 nm wavelength, which is the first, to our knowledge, report for a HWCVD a-Si:H waveguide. Published version Engineering and Physical Sciences Research Council (EPSRC) (EP/L00044X/1, EP/N013247/1, EP/ L02112G/1). 2021-05-05T07:41:32Z 2021-05-05T07:41:32Z 2019 Journal Article Oo, S. Z., Tarazona, A., Khokhar, A. Z., Petra, R., Franz, Y., Mashanovich, G. Z., Reed, G. T., Peacock, A. C. & Chong, H. M. H. (2019). Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices. Photonics Research, 7(2), 193-200. https://dx.doi.org/10.1364/PRJ.7.000193 2327-9125 https://hdl.handle.net/10356/148729 10.1364/PRJ.7.000193 2-s2.0-85063939824 2 7 193 200 en Photonics Research © 2019 Chinese Laser Press. Published by Chinese Laser Press under the terms of the Creative Commons Attribution 4.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI. application/pdf |
| spellingShingle | Engineering::Electrical and electronic engineering Microcrystalline Silicon Films Oo, Swe Z. Tarazona, Antulio Khokhar, Ali Z. Petra, Rafidah Franz, Yohann Mashanovich, Goran Z. Reed, Graham T. Peacock, Anna C. Chong, Harold M. H. Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices |
| title | Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices |
| title_full | Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices |
| title_fullStr | Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices |
| title_full_unstemmed | Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices |
| title_short | Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices |
| title_sort | hot wire chemical vapor deposition low loss hydrogenated amorphous silicon waveguides for silicon photonic devices |
| topic | Engineering::Electrical and electronic engineering Microcrystalline Silicon Films |
| url | https://hdl.handle.net/10356/148729 |
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