Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices

Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices

We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide...

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Dettagli Bibliografici
Autori principali: Oo, Swe Z., Tarazona, Antulio, Khokhar, Ali Z., Petra, Rafidah, Franz, Yohann, Mashanovich, Goran Z., Reed, Graham T., Peacock, Anna C., Chong, Harold M. H.
Altri autori: School of Electrical and Electronic Engineering
Natura: Journal Article
Lingua:English
Pubblicazione: 2021
Soggetti:
Engineering::Electrical and electronic engineering
Microcrystalline Silicon
Films
Accesso online:https://hdl.handle.net/10356/148729

Accesso online

https://hdl.handle.net/10356/148729

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