Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies
Light-mediated reactive oxygen species generation with water and oxygen is generally regarded as a mild and efficient way for organic pollutants removal. However, it is highly difficult but desirable to construct a photochemical system with increased reactive oxygen species production. Herein, by us...
Main Authors: | , , , , , , , , , |
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Format: | Journal Article |
Language: | English |
Published: |
2021
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Online Access: | https://hdl.handle.net/10356/151354 |
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author | Ding, Penghui Di, Jun Chen, Xiaoliu Zhao, Junze Gu, Kaizhi Zhang, Yi Yin, Sheng Liu, Gaopeng Xia, Jiexiang Li, Huaming |
author2 | School of Materials Science and Engineering |
author_facet | School of Materials Science and Engineering Ding, Penghui Di, Jun Chen, Xiaoliu Zhao, Junze Gu, Kaizhi Zhang, Yi Yin, Sheng Liu, Gaopeng Xia, Jiexiang Li, Huaming |
author_sort | Ding, Penghui |
collection | NTU |
description | Light-mediated reactive oxygen species generation with water and oxygen is generally regarded as a mild and efficient way for organic pollutants removal. However, it is highly difficult but desirable to construct a photochemical system with increased reactive oxygen species production. Herein, by using Bi2O2CO3 as a prototype, we devise a simple metal chloride-involved etching method to achieve better light absorption and charge carriers separation in a wide-band-gap semiconductor, thus giving rise to improved molecular oxygen activation. The improved photoinduced reactive oxygen species production is further verified by excellent photocatalytic degradation ability of RhB, TC and BPA under visible and ultraviolet light illumination. In addition, the metal chloride-induced strategies—heterojunction formation and cation doping—significantly affect the dynamics and transfer of carriers, which are advantageous to manipulate one-/two-electron pathway for producing reactive oxygen species. |
first_indexed | 2024-10-01T03:18:55Z |
format | Journal Article |
id | ntu-10356/151354 |
institution | Nanyang Technological University |
language | English |
last_indexed | 2024-10-01T03:18:55Z |
publishDate | 2021 |
record_format | dspace |
spelling | ntu-10356/1513542021-07-09T02:06:36Z Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies Ding, Penghui Di, Jun Chen, Xiaoliu Zhao, Junze Gu, Kaizhi Zhang, Yi Yin, Sheng Liu, Gaopeng Xia, Jiexiang Li, Huaming School of Materials Science and Engineering Centre for Programmable Materials Engineering::Materials Metal Chloride Heterojunction Light-mediated reactive oxygen species generation with water and oxygen is generally regarded as a mild and efficient way for organic pollutants removal. However, it is highly difficult but desirable to construct a photochemical system with increased reactive oxygen species production. Herein, by using Bi2O2CO3 as a prototype, we devise a simple metal chloride-involved etching method to achieve better light absorption and charge carriers separation in a wide-band-gap semiconductor, thus giving rise to improved molecular oxygen activation. The improved photoinduced reactive oxygen species production is further verified by excellent photocatalytic degradation ability of RhB, TC and BPA under visible and ultraviolet light illumination. In addition, the metal chloride-induced strategies—heterojunction formation and cation doping—significantly affect the dynamics and transfer of carriers, which are advantageous to manipulate one-/two-electron pathway for producing reactive oxygen species. This work was financially supported by the National Natural Science Foundation of China (Nos. 21476098, 21471069, 21576123, and 21676128). 2021-07-09T02:06:36Z 2021-07-09T02:06:36Z 2018 Journal Article Ding, P., Di, J., Chen, X., Zhao, J., Gu, K., Zhang, Y., Yin, S., Liu, G., Xia, J. & Li, H. (2018). Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies. Applied Catalysis B: Environmental, 245, 325-333. https://dx.doi.org/10.1016/j.apcatb.2018.12.047 0926-3373 0000-0002-7394-1130 https://hdl.handle.net/10356/151354 10.1016/j.apcatb.2018.12.047 2-s2.0-85059359442 245 325 333 en Applied Catalysis B: Environmental © 2018 Elsevier B.V. All rights reserved. |
spellingShingle | Engineering::Materials Metal Chloride Heterojunction Ding, Penghui Di, Jun Chen, Xiaoliu Zhao, Junze Gu, Kaizhi Zhang, Yi Yin, Sheng Liu, Gaopeng Xia, Jiexiang Li, Huaming Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies |
title | Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies |
title_full | Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies |
title_fullStr | Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies |
title_full_unstemmed | Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies |
title_short | Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies |
title_sort | partially etched bi2o2co3 by metal chloride for enhanced reactive oxygen species generation a tale of two strategies |
topic | Engineering::Materials Metal Chloride Heterojunction |
url | https://hdl.handle.net/10356/151354 |
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