Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies

Light-mediated reactive oxygen species generation with water and oxygen is generally regarded as a mild and efficient way for organic pollutants removal. However, it is highly difficult but desirable to construct a photochemical system with increased reactive oxygen species production. Herein, by us...

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Main Authors: Ding, Penghui, Di, Jun, Chen, Xiaoliu, Zhao, Junze, Gu, Kaizhi, Zhang, Yi, Yin, Sheng, Liu, Gaopeng, Xia, Jiexiang, Li, Huaming
Other Authors: School of Materials Science and Engineering
Format: Journal Article
Language:English
Published: 2021
Subjects:
Online Access:https://hdl.handle.net/10356/151354
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author Ding, Penghui
Di, Jun
Chen, Xiaoliu
Zhao, Junze
Gu, Kaizhi
Zhang, Yi
Yin, Sheng
Liu, Gaopeng
Xia, Jiexiang
Li, Huaming
author2 School of Materials Science and Engineering
author_facet School of Materials Science and Engineering
Ding, Penghui
Di, Jun
Chen, Xiaoliu
Zhao, Junze
Gu, Kaizhi
Zhang, Yi
Yin, Sheng
Liu, Gaopeng
Xia, Jiexiang
Li, Huaming
author_sort Ding, Penghui
collection NTU
description Light-mediated reactive oxygen species generation with water and oxygen is generally regarded as a mild and efficient way for organic pollutants removal. However, it is highly difficult but desirable to construct a photochemical system with increased reactive oxygen species production. Herein, by using Bi2O2CO3 as a prototype, we devise a simple metal chloride-involved etching method to achieve better light absorption and charge carriers separation in a wide-band-gap semiconductor, thus giving rise to improved molecular oxygen activation. The improved photoinduced reactive oxygen species production is further verified by excellent photocatalytic degradation ability of RhB, TC and BPA under visible and ultraviolet light illumination. In addition, the metal chloride-induced strategies—heterojunction formation and cation doping—significantly affect the dynamics and transfer of carriers, which are advantageous to manipulate one-/two-electron pathway for producing reactive oxygen species.
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spelling ntu-10356/1513542021-07-09T02:06:36Z Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies Ding, Penghui Di, Jun Chen, Xiaoliu Zhao, Junze Gu, Kaizhi Zhang, Yi Yin, Sheng Liu, Gaopeng Xia, Jiexiang Li, Huaming School of Materials Science and Engineering Centre for Programmable Materials Engineering::Materials Metal Chloride Heterojunction Light-mediated reactive oxygen species generation with water and oxygen is generally regarded as a mild and efficient way for organic pollutants removal. However, it is highly difficult but desirable to construct a photochemical system with increased reactive oxygen species production. Herein, by using Bi2O2CO3 as a prototype, we devise a simple metal chloride-involved etching method to achieve better light absorption and charge carriers separation in a wide-band-gap semiconductor, thus giving rise to improved molecular oxygen activation. The improved photoinduced reactive oxygen species production is further verified by excellent photocatalytic degradation ability of RhB, TC and BPA under visible and ultraviolet light illumination. In addition, the metal chloride-induced strategies—heterojunction formation and cation doping—significantly affect the dynamics and transfer of carriers, which are advantageous to manipulate one-/two-electron pathway for producing reactive oxygen species. This work was financially supported by the National Natural Science Foundation of China (Nos. 21476098, 21471069, 21576123, and 21676128). 2021-07-09T02:06:36Z 2021-07-09T02:06:36Z 2018 Journal Article Ding, P., Di, J., Chen, X., Zhao, J., Gu, K., Zhang, Y., Yin, S., Liu, G., Xia, J. & Li, H. (2018). Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies. Applied Catalysis B: Environmental, 245, 325-333. https://dx.doi.org/10.1016/j.apcatb.2018.12.047 0926-3373 0000-0002-7394-1130 https://hdl.handle.net/10356/151354 10.1016/j.apcatb.2018.12.047 2-s2.0-85059359442 245 325 333 en Applied Catalysis B: Environmental © 2018 Elsevier B.V. All rights reserved.
spellingShingle Engineering::Materials
Metal Chloride
Heterojunction
Ding, Penghui
Di, Jun
Chen, Xiaoliu
Zhao, Junze
Gu, Kaizhi
Zhang, Yi
Yin, Sheng
Liu, Gaopeng
Xia, Jiexiang
Li, Huaming
Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies
title Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies
title_full Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies
title_fullStr Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies
title_full_unstemmed Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies
title_short Partially etched Bi2O2CO3 by metal chloride for enhanced reactive oxygen species generation : a tale of two strategies
title_sort partially etched bi2o2co3 by metal chloride for enhanced reactive oxygen species generation a tale of two strategies
topic Engineering::Materials
Metal Chloride
Heterojunction
url https://hdl.handle.net/10356/151354
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