Deposited poly-Si as on-demand linewidth compensator for on-chip Fabry-Perot interferometer and vertical linear variable optical filter bandpass and passband manipulation

Deep reactive ion etching (DRIE) is an important process for etching vertical structures for microelectromechanical systems. Due to the sidewall profile of some photoresists as well as effects from upstream processes, bulk micromachined structures, to a certain extent, could differ from expected. Co...

Celý popis

Podrobná bibliografie
Hlavní autoři: Goh, Simon Chun Kiat, Chen, Nan, Shiau, Li Lynn, Tay, Beng Kang, Lee, ChengKuo, Tan, Chuan Seng
Další autoři: School of Electrical and Electronic Engineering
Médium: Journal Article
Jazyk:English
Vydáno: 2021
Témata:
On-line přístup:https://hdl.handle.net/10356/152182

Podobné jednotky