Deposited poly-Si as on-demand linewidth compensator for on-chip Fabry-Perot interferometer and vertical linear variable optical filter bandpass and passband manipulation
Deep reactive ion etching (DRIE) is an important process for etching vertical structures for microelectromechanical systems. Due to the sidewall profile of some photoresists as well as effects from upstream processes, bulk micromachined structures, to a certain extent, could differ from expected. Co...
| Hlavní autoři: | , , , , , |
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| Další autoři: | |
| Médium: | Journal Article |
| Jazyk: | English |
| Vydáno: |
2021
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| Témata: | |
| On-line přístup: | https://hdl.handle.net/10356/152182 |