Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability
Nanotransfer printing techniques have attracted significant attention due to their outstanding simplicity, cost-effectiveness, and high throughput. However, conventional methods via a chemical medium hamper the efficient fabrication with large-area uniformity and rapid development of electronic and...
| Main Authors: | , , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2022
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/156826 |
| _version_ | 1811688150894903296 |
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| author | Zhao, Zhi-Jun Shin, Sang-Ho Lee, Sang Yeon Son, Bongkwon Liao, Yikai Hwang, Soonhyoung Jeon, Sohee Kang, Hyeokjoong Kim, Munho Jeong, Jun-Ho |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Zhao, Zhi-Jun Shin, Sang-Ho Lee, Sang Yeon Son, Bongkwon Liao, Yikai Hwang, Soonhyoung Jeon, Sohee Kang, Hyeokjoong Kim, Munho Jeong, Jun-Ho |
| author_sort | Zhao, Zhi-Jun |
| collection | NTU |
| description | Nanotransfer printing techniques have attracted significant attention due to their outstanding simplicity, cost-effectiveness, and high throughput. However, conventional methods via a chemical medium hamper the efficient fabrication with large-area uniformity and rapid development of electronic and photonic devices. Herein, we report a direct chemisorption-assisted nanotransfer printing technique based on the nanoscale lower melting effect, which is an enabling technology for two- or three-dimensional nanostructures with feature sizes ranging from tens of nanometers up to a 6 in. wafer-scale. The method solves the major bottleneck (large-scale uniform metal catalysts with nanopatterns) encountered by metal-assisted chemical etching. It also achieves wafer-scale, uniform, and controllable nanostructures with extremely high aspect ratios. We further demonstrate excellent uniformity and high performance of the resultant devices by fabricating 100 photodetectors on a 6 in. Si wafer. Therefore, our method can create a viable route for next-generation, wafer-scale, uniformly ordered, and controllable nanofabrication, leading to significant advances in various applications, such as energy harvesting, quantum, electronic, and photonic devices. |
| first_indexed | 2024-10-01T05:27:38Z |
| format | Journal Article |
| id | ntu-10356/156826 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T05:27:38Z |
| publishDate | 2022 |
| record_format | dspace |
| spelling | ntu-10356/1568262022-05-01T02:55:34Z Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability Zhao, Zhi-Jun Shin, Sang-Ho Lee, Sang Yeon Son, Bongkwon Liao, Yikai Hwang, Soonhyoung Jeon, Sohee Kang, Hyeokjoong Kim, Munho Jeong, Jun-Ho School of Electrical and Electronic Engineering Engineering::Electrical and electronic engineering::Semiconductors Nanotransfer Printing Metal-Assisted Chemical Etching Nanotransfer printing techniques have attracted significant attention due to their outstanding simplicity, cost-effectiveness, and high throughput. However, conventional methods via a chemical medium hamper the efficient fabrication with large-area uniformity and rapid development of electronic and photonic devices. Herein, we report a direct chemisorption-assisted nanotransfer printing technique based on the nanoscale lower melting effect, which is an enabling technology for two- or three-dimensional nanostructures with feature sizes ranging from tens of nanometers up to a 6 in. wafer-scale. The method solves the major bottleneck (large-scale uniform metal catalysts with nanopatterns) encountered by metal-assisted chemical etching. It also achieves wafer-scale, uniform, and controllable nanostructures with extremely high aspect ratios. We further demonstrate excellent uniformity and high performance of the resultant devices by fabricating 100 photodetectors on a 6 in. Si wafer. Therefore, our method can create a viable route for next-generation, wafer-scale, uniformly ordered, and controllable nanofabrication, leading to significant advances in various applications, such as energy harvesting, quantum, electronic, and photonic devices. Agency for Science, Technology and Research (A*STAR) Ministry of Education (MOE) Submitted/Accepted version This work was supported by the A∗STAR, Singapore, Advanced Manufacturing and Engineering (AME) Young Individual Research Grant (YIRG) under the Project A2084c0066, Ministry of Education, Singapore, under the Grant ACRF Tier 2 grant (T2EP50120-0003). This work was also supported by the Center for Advanced Metamaterials (CAMM), funded by the Ministry of Science, ICT and Future Planning, Korea, through the Global Frontier Project (CAMM-No. 2014M3A6B3063707), Institute of Information & Communications Technology Planning & Evaluation (IITP) grant funded by the Korean government (MSIT) (No. 2020-0-00831, Development of holographic lithography equipment and printing technology for security and books), and the Basic Research Program of the Korea Institute of Machinery and Materials (NK224C). Authors acknowledge Chuan Seng Tan at Nanyang Technological University for his technical support. Authors also acknowledge the support of Nanyang NanoFabrication Centre (N2FC). 2022-04-26T01:31:56Z 2022-04-26T01:31:56Z 2022 Journal Article Zhao, Z., Shin, S., Lee, S. Y., Son, B., Liao, Y., Hwang, S., Jeon, S., Kang, H., Kim, M. & Jeong, J. (2022). Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability. ACS Nano, 16(1), 378-385. https://dx.doi.org/10.1021/acsnano.1c06781 1936-0851 https://hdl.handle.net/10356/156826 10.1021/acsnano.1c06781 34978803 2-s2.0-85122682814 1 16 378 385 en A2084c0066 T2EP50120-0003 2018-T1-002-115 (RG 173/18) ACS Nano This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsnano.1c06781. application/pdf |
| spellingShingle | Engineering::Electrical and electronic engineering::Semiconductors Nanotransfer Printing Metal-Assisted Chemical Etching Zhao, Zhi-Jun Shin, Sang-Ho Lee, Sang Yeon Son, Bongkwon Liao, Yikai Hwang, Soonhyoung Jeon, Sohee Kang, Hyeokjoong Kim, Munho Jeong, Jun-Ho Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability |
| title | Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability |
| title_full | Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability |
| title_fullStr | Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability |
| title_full_unstemmed | Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability |
| title_short | Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability |
| title_sort | direct chemisorption assisted nanotransfer printing with wafer scale uniformity and controllability |
| topic | Engineering::Electrical and electronic engineering::Semiconductors Nanotransfer Printing Metal-Assisted Chemical Etching |
| url | https://hdl.handle.net/10356/156826 |
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