Machine learning techniques and systems for mask-face detection—survey and a new OOD-mask approach

Machine learning techniques and systems for mask-face detection—survey and a new OOD-mask approach

Mask-face detection has been a significant task since the outbreak of the COVID-19 pandemic in early 2020. While various reviews on mask-face detection techniques up to 2021 are available, little has been reviewed on the distinction between two-class (i.e., wearing mask and without mask) and three-c...

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Bibliographic Details
Main Authors: Hu, Youwen, Xu, Yicheng, Zhuang, Huiping, Weng, Zhenyu, Lin, Zhiping
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2023
Subjects:
Engineering::Electrical and electronic engineering
COVID-19
Face Mask
Online Access:https://hdl.handle.net/10356/165202

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