A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene
Fabricating highly water-soluble and chlorine-free precursors from Pd complexes remains challenging. Here, a novel Pd precursor (ammonium dinitrooxalato palladium(II) ((NH4)2[Pd(NO2)2(C2O4)]·2H2O)) is synthesized to address this challenge. Additionally, a Pd/Al2O3 adsorbent is prepared using γ-Al2O3...
| Main Authors: | , , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2023
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/170660 |
| _version_ | 1811680462043611136 |
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| author | Xie, Jiyang Ng, Kelvin Dai, Yunsheng Jiang, Jinke Yu, Juan Gao, Anli Wang, Hongqin Huang, Xinyu Liu, Weiping Guo, Shuailong |
| author2 | School of Mechanical and Aerospace Engineering |
| author_facet | School of Mechanical and Aerospace Engineering Xie, Jiyang Ng, Kelvin Dai, Yunsheng Jiang, Jinke Yu, Juan Gao, Anli Wang, Hongqin Huang, Xinyu Liu, Weiping Guo, Shuailong |
| author_sort | Xie, Jiyang |
| collection | NTU |
| description | Fabricating highly water-soluble and chlorine-free precursors from Pd complexes remains challenging. Here, a novel Pd precursor (ammonium dinitrooxalato palladium(II) ((NH4)2[Pd(NO2)2(C2O4)]·2H2O)) is synthesized to address this challenge. Additionally, a Pd/Al2O3 adsorbent is prepared using γ-Al2O3 as a base material to host Pd. The ligand action of the Pd complex forms single Pd atoms and Pd sub-nano clusters on the surface of γ-Al2O3. Pd/Al2O3-4 as an adsorbent is evaluated using the benzene ultra-deep desulfurization procedure, wherein thiophene is used as a probe molecule. The sulfur adsorption capacity of Pd/Al2O3-4 is 1.76 mg g−1 for the ultra-deep adsorptive desulfurization of benzene at a sulfur concentration of 50 ppm. The sulfur adsorption capacity of the new Pd/Al2O3-4 adsorbent is 21.8% higher than that of a commercial Pd/Al2O3 adsorbent. In addition, the stability and durability of Pd/Al2O3-4 are investigated at a sulfur concentration of 1 ppm. The Pd/Al2O3-4 adsorbent achieves ≈100% thiophene removal after 434 h, which is 62 h more than the time required by the commercial Pd/Al2O3 adsorbent. The novel Pd precursor shows excellent potential for industrial applications, and the Pd/Al2O3-4 adsorbent can be produced on a mass scale of 500 kg per batch. |
| first_indexed | 2024-10-01T03:25:26Z |
| format | Journal Article |
| id | ntu-10356/170660 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T03:25:26Z |
| publishDate | 2023 |
| record_format | dspace |
| spelling | ntu-10356/1706602023-09-25T05:26:52Z A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene Xie, Jiyang Ng, Kelvin Dai, Yunsheng Jiang, Jinke Yu, Juan Gao, Anli Wang, Hongqin Huang, Xinyu Liu, Weiping Guo, Shuailong School of Mechanical and Aerospace Engineering Singapore Centre for 3D Printing Engineering::Chemical engineering Pd Precursors Pd Sub-nanoclusters Fabricating highly water-soluble and chlorine-free precursors from Pd complexes remains challenging. Here, a novel Pd precursor (ammonium dinitrooxalato palladium(II) ((NH4)2[Pd(NO2)2(C2O4)]·2H2O)) is synthesized to address this challenge. Additionally, a Pd/Al2O3 adsorbent is prepared using γ-Al2O3 as a base material to host Pd. The ligand action of the Pd complex forms single Pd atoms and Pd sub-nano clusters on the surface of γ-Al2O3. Pd/Al2O3-4 as an adsorbent is evaluated using the benzene ultra-deep desulfurization procedure, wherein thiophene is used as a probe molecule. The sulfur adsorption capacity of Pd/Al2O3-4 is 1.76 mg g−1 for the ultra-deep adsorptive desulfurization of benzene at a sulfur concentration of 50 ppm. The sulfur adsorption capacity of the new Pd/Al2O3-4 adsorbent is 21.8% higher than that of a commercial Pd/Al2O3 adsorbent. In addition, the stability and durability of Pd/Al2O3-4 are investigated at a sulfur concentration of 1 ppm. The Pd/Al2O3-4 adsorbent achieves ≈100% thiophene removal after 434 h, which is 62 h more than the time required by the commercial Pd/Al2O3 adsorbent. The novel Pd precursor shows excellent potential for industrial applications, and the Pd/Al2O3-4 adsorbent can be produced on a mass scale of 500 kg per batch. This study was supported by the National Science Foundation of China (Grant No. 21763014), Central Government Guides Local Science and Technology Development Funds (202207AC110019), Major Science and Technology Programs of Yunan (202102AB080007-2), Yunnan Provincial R&D Programs (No. YPML-2022050231), and the Major Science and Technology Program of Yunan (202002AB080001-1). 2023-09-25T05:26:52Z 2023-09-25T05:26:52Z 2023 Journal Article Xie, J., Ng, K., Dai, Y., Jiang, J., Yu, J., Gao, A., Wang, H., Huang, X., Liu, W. & Guo, S. (2023). A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene. Advanced Functional Materials, 33(25), 2213837-. https://dx.doi.org/10.1002/adfm.202213837 1616-301X https://hdl.handle.net/10356/170660 10.1002/adfm.202213837 2-s2.0-85150831633 25 33 2213837 en Advanced Functional Materials © 2023 Wiley-VCH GmbH. All rights reserved. |
| spellingShingle | Engineering::Chemical engineering Pd Precursors Pd Sub-nanoclusters Xie, Jiyang Ng, Kelvin Dai, Yunsheng Jiang, Jinke Yu, Juan Gao, Anli Wang, Hongqin Huang, Xinyu Liu, Weiping Guo, Shuailong A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene |
| title | A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene |
| title_full | A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene |
| title_fullStr | A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene |
| title_full_unstemmed | A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene |
| title_short | A novel Pd precursor loaded γ-Al₂O₃ with excellent adsorbent performance for ultra-deep adsorptive desulfurization of benzene |
| title_sort | novel pd precursor loaded γ al₂o₃ with excellent adsorbent performance for ultra deep adsorptive desulfurization of benzene |
| topic | Engineering::Chemical engineering Pd Precursors Pd Sub-nanoclusters |
| url | https://hdl.handle.net/10356/170660 |
| work_keys_str_mv | AT xiejiyang anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT ngkelvin anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT daiyunsheng anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT jiangjinke anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT yujuan anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT gaoanli anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT wanghongqin anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT huangxinyu anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT liuweiping anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT guoshuailong anovelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT xiejiyang novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT ngkelvin novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT daiyunsheng novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT jiangjinke novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT yujuan novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT gaoanli novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT wanghongqin novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT huangxinyu novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT liuweiping novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene AT guoshuailong novelpdprecursorloadedgal2o3withexcellentadsorbentperformanceforultradeepadsorptivedesulfurizationofbenzene |