Symmetry breaking for semiconductor photocatalysis
Numerous strategies have been developed to tailor the photocatalytic performance of catalysts. However, do any general commonalities exist in these strategies for activity improvement? It is desirable to explore the general regularity of these strategies, thus guiding further developments in the fie...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2024
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| Online Access: | https://hdl.handle.net/10356/173402 |
| _version_ | 1824453610907369472 |
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| author | Di, Jun Jiang, Wei Liu, Zheng |
| author2 | School of Materials Science and Engineering |
| author_facet | School of Materials Science and Engineering Di, Jun Jiang, Wei Liu, Zheng |
| author_sort | Di, Jun |
| collection | NTU |
| description | Numerous strategies have been developed to tailor the photocatalytic performance of catalysts. However, do any general commonalities exist in these strategies for activity improvement? It is desirable to explore the general regularity of these strategies, thus guiding further developments in the field of photocatalysis. In this review, we propose that the key or essential nature of improved photocatalytic activity depends considerably on the symmetry breaking of the materials. The detailed contributions of symmetry breaking to the increased photocatalytic activity are intensely discussed and summarized based on the location of symmetry breaking; namely, spontaneous symmetry breaking in the material interior, localized symmetry breaking on the material surface, and external-field-induced symmetry breaking beyond the material. |
| first_indexed | 2025-02-19T03:09:10Z |
| format | Journal Article |
| id | ntu-10356/173402 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2025-02-19T03:09:10Z |
| publishDate | 2024 |
| record_format | dspace |
| spelling | ntu-10356/1734022024-02-06T07:06:07Z Symmetry breaking for semiconductor photocatalysis Di, Jun Jiang, Wei Liu, Zheng School of Materials Science and Engineering Chemistry Engineering Photocatalysis Symmetry Breaking Numerous strategies have been developed to tailor the photocatalytic performance of catalysts. However, do any general commonalities exist in these strategies for activity improvement? It is desirable to explore the general regularity of these strategies, thus guiding further developments in the field of photocatalysis. In this review, we propose that the key or essential nature of improved photocatalytic activity depends considerably on the symmetry breaking of the materials. The detailed contributions of symmetry breaking to the increased photocatalytic activity are intensely discussed and summarized based on the location of symmetry breaking; namely, spontaneous symmetry breaking in the material interior, localized symmetry breaking on the material surface, and external-field-induced symmetry breaking beyond the material. Ministry of Education (MOE) Submitted/Accepted version This work was supported by Singapore Ministry of Education AcRF Tier 2 (MOE2019-T2-2-105), AcRF Tier 1 RG4/17, RG161/19, Fundamental Research Funds for the Central Universities (Project 30922010302), and Start-Up Grant from Nanjing University of Science and Technology (Project AE89991/397). 2024-02-02T08:08:08Z 2024-02-02T08:08:08Z 2022 Journal Article Di, J., Jiang, W. & Liu, Z. (2022). Symmetry breaking for semiconductor photocatalysis. Trends in Chemistry, 4(11), 1045-1055. https://dx.doi.org/10.1016/j.trechm.2022.08.010 2589-5974 https://hdl.handle.net/10356/173402 10.1016/j.trechm.2022.08.010 2-s2.0-85138595707 11 4 1045 1055 en MOE2019-T2-2-105 RG4/17 RG161/19 Trends in Chemistry © 2022 Elsevier Inc. All rights reserved. This article may be downloaded for personal use only. Any other use requires prior permission of the copyright holder. The Version of Record is available online at http://doi.org/10.1016/j.trechm.2022.08.010. application/pdf |
| spellingShingle | Chemistry Engineering Photocatalysis Symmetry Breaking Di, Jun Jiang, Wei Liu, Zheng Symmetry breaking for semiconductor photocatalysis |
| title | Symmetry breaking for semiconductor photocatalysis |
| title_full | Symmetry breaking for semiconductor photocatalysis |
| title_fullStr | Symmetry breaking for semiconductor photocatalysis |
| title_full_unstemmed | Symmetry breaking for semiconductor photocatalysis |
| title_short | Symmetry breaking for semiconductor photocatalysis |
| title_sort | symmetry breaking for semiconductor photocatalysis |
| topic | Chemistry Engineering Photocatalysis Symmetry Breaking |
| url | https://hdl.handle.net/10356/173402 |
| work_keys_str_mv | AT dijun symmetrybreakingforsemiconductorphotocatalysis AT jiangwei symmetrybreakingforsemiconductorphotocatalysis AT liuzheng symmetrybreakingforsemiconductorphotocatalysis |