Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles
Twisted bilayer (TB) transition metal dichalcogenides (TMDCs) beyond TB-graphene are considered an ideal platform for investigating condensed matter physics, due to the moiré superlattices-related peculiar band structures and distinct electronic properties. The growth of large-area and high-quality...
| Main Authors: | , , , , , , , , , , , |
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| Format: | Journal Article |
| Language: | English |
| Published: |
2024
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/174915 |
| _version_ | 1811676917300985856 |
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| author | Xu, Manzhang Ji, Hongjia Zheng, Lu Li, Weiwei Wang, Jing Wang, Hanxin Luo, Lei Lu, Qianbo Gan, Xuetao Liu, Zheng Wang, Xuewen Huang, Wei |
| author2 | School of Materials Science and Engineering |
| author_facet | School of Materials Science and Engineering Xu, Manzhang Ji, Hongjia Zheng, Lu Li, Weiwei Wang, Jing Wang, Hanxin Luo, Lei Lu, Qianbo Gan, Xuetao Liu, Zheng Wang, Xuewen Huang, Wei |
| author_sort | Xu, Manzhang |
| collection | NTU |
| description | Twisted bilayer (TB) transition metal dichalcogenides (TMDCs) beyond TB-graphene are considered an ideal platform for investigating condensed matter physics, due to the moiré superlattices-related peculiar band structures and distinct electronic properties. The growth of large-area and high-quality TB-TMDCs with wide twist angles would be significant for exploring twist angle-dependent physics and applications, but remains challenging to implement. Here, we propose a reconfiguring nucleation chemical vapor deposition (CVD) strategy for directly synthesizing TB-MoS2 with twist angles from 0° to 120°. The twist angles-dependent Moiré periodicity can be clearly observed, and the interlayer coupling shows a strong relationship to the twist angles. Moreover, the yield of TB-MoS2 in bilayer MoS2 and density of TB-MoS2 are significantly improved to 17.2% and 28.9 pieces/mm2 by tailoring gas flow rate and molar ratio of NaCl to MoO3. The proposed reconfiguring nucleation approach opens an avenue for the precise growth of TB-TMDCs for both fundamental research and practical applications. |
| first_indexed | 2024-10-01T02:29:05Z |
| format | Journal Article |
| id | ntu-10356/174915 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T02:29:05Z |
| publishDate | 2024 |
| record_format | dspace |
| spelling | ntu-10356/1749152024-04-19T15:59:51Z Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles Xu, Manzhang Ji, Hongjia Zheng, Lu Li, Weiwei Wang, Jing Wang, Hanxin Luo, Lei Lu, Qianbo Gan, Xuetao Liu, Zheng Wang, Xuewen Huang, Wei School of Materials Science and Engineering School of Electrical and Electronic Engineering CINTRA CNRS/NTU/THALES, UMI 3288 Engineering Bilayer membrane Chemical vapor deposition Twisted bilayer (TB) transition metal dichalcogenides (TMDCs) beyond TB-graphene are considered an ideal platform for investigating condensed matter physics, due to the moiré superlattices-related peculiar band structures and distinct electronic properties. The growth of large-area and high-quality TB-TMDCs with wide twist angles would be significant for exploring twist angle-dependent physics and applications, but remains challenging to implement. Here, we propose a reconfiguring nucleation chemical vapor deposition (CVD) strategy for directly synthesizing TB-MoS2 with twist angles from 0° to 120°. The twist angles-dependent Moiré periodicity can be clearly observed, and the interlayer coupling shows a strong relationship to the twist angles. Moreover, the yield of TB-MoS2 in bilayer MoS2 and density of TB-MoS2 are significantly improved to 17.2% and 28.9 pieces/mm2 by tailoring gas flow rate and molar ratio of NaCl to MoO3. The proposed reconfiguring nucleation approach opens an avenue for the precise growth of TB-TMDCs for both fundamental research and practical applications. Agency for Science, Technology and Research (A*STAR) National Research Foundation (NRF) Published version The authors gratefully acknowledge financial support by the National Natural Science Foundation of China (62288102, 62304182, 62371397, and 61974120), the Natural Science Foundation of Shaanxi Province (2022JQ-659 and 2023-JC-YB-495), the Practice and Innovation Funds for Graduate Students of Northwestern Polytechnical University (PF2023037), and the Fundamental Research Funds for the Central Universities, the start-up funds from Northwestern Polytechnical University (23GH02028). This work was also supported by National Research Foundation–Competitive Research Program (NRF-CRP22- 2019-0007 and NRF-CRP21-2018-0007) and A*STAR under its AME IRG Grant (A2083c0052). 2024-04-16T02:48:25Z 2024-04-16T02:48:25Z 2024 Journal Article Xu, M., Ji, H., Zheng, L., Li, W., Wang, J., Wang, H., Luo, L., Lu, Q., Gan, X., Liu, Z., Wang, X. & Huang, W. (2024). Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles. Nature Communications, 15(1), 562-. https://dx.doi.org/10.1038/s41467-023-44598-w 2041-1723 https://hdl.handle.net/10356/174915 10.1038/s41467-023-44598-w 38233382 2-s2.0-85182419857 1 15 562 en NRF-CRP22-2019-0007 NRF-CRP21-2018-0007 A2083c0052 Nature Communications © The Author(s) 2024. Open Access. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/ licenses/by/4.0/. application/pdf |
| spellingShingle | Engineering Bilayer membrane Chemical vapor deposition Xu, Manzhang Ji, Hongjia Zheng, Lu Li, Weiwei Wang, Jing Wang, Hanxin Luo, Lei Lu, Qianbo Gan, Xuetao Liu, Zheng Wang, Xuewen Huang, Wei Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles |
| title | Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles |
| title_full | Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles |
| title_fullStr | Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles |
| title_full_unstemmed | Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles |
| title_short | Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles |
| title_sort | reconfiguring nucleation for cvd growth of twisted bilayer mos2 with a wide range of twist angles |
| topic | Engineering Bilayer membrane Chemical vapor deposition |
| url | https://hdl.handle.net/10356/174915 |
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