| Summary: | In recent decades, graphene has become a central focus of research, revolutionising
materials science, and applications in nanoelectronics and semiconductors with its
exceptional properties. Its versatile nature renders it highly suitable for advancing
next-generation electronic devices with improved performances. As research into
graphene progresses rapidly, there is escalating demand for more sophisticated
fabrication processes to meet the everchanging needs and specifications of various
industries. This report delves into the precise patterning of graphene using the Atomic
Force Microscopy (AFM) with conditioned parameters. Despite its remarkable
properties, achieving complex graphene patterns with sub-nanometre resolutions
remains a challenge. The effects of the electrical bias applied to the tip of the AFM
and the level of surrounding humidity, on the patterning process is investigated. The
results shows the optimum parameter conditions for graphene fabrication using this
technique, highlighting both its limitations and contributions to advancements in
graphene applications.
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