Study of the mask-less lithography system and its optimization for high resolution pattern of positive photoresist
The research aim is to investigate the optimal resolution of positive lithographic patterns under the 20x lens and the corresponding experimental parameters based on the DMD-based maskless lithography system. The experimental result is examined carefully with the assistance of SEM to check the accur...
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| Format: | Thesis-Master by Coursework |
| Language: | English |
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Nanyang Technological University
2024
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| Online Access: | https://hdl.handle.net/10356/178212 |