Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure
Maskless lithography has a broad prospect in fabricating 3D microstructures by negative photoresist SU-8, which is popular in MEMS and microfluidics application. Thus, in this dissertation project, I study the optimal UV exposure condition for the DMD-based maskless lithography and build some 3D mic...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis-Master by Coursework |
| Language: | English |
| Published: |
Nanyang Technological University
2024
|
| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/179410 |
| _version_ | 1824455617759150080 |
|---|---|
| author | Zhu, Junlei |
| author2 | Lee Seok Woo |
| author_facet | Lee Seok Woo Zhu, Junlei |
| author_sort | Zhu, Junlei |
| collection | NTU |
| description | Maskless lithography has a broad prospect in fabricating 3D microstructures by negative photoresist SU-8, which is popular in MEMS and microfluidics application. Thus, in this dissertation project, I study the optimal UV exposure condition for the DMD-based maskless lithography and build some 3D microstructures by SU-8 photoresist.
For SU-8 3050 under 10x Lens, the optimal results are obtained at 60%intensity with 300s exposure time. For SU-8 3010 under 10x Lens, the optimal results are obtained at 50% intensity with 200s exposure time or 60% intensity with 300s exposure time. For SU-8 3050 under 20x Lens, the optimal results are obtained at 70% intensity with 100s exposure time. For SU-8 3010 under 20x Lens, the optimal results are obtained at 40% intensity with 400s exposure time.
The 3D SU-8 microstructures can be fabricated by multi-exposure or shallow exposure methods. The former one is suitable for stacked patterns and the other one is suitable for bridge structures. A micromixer and several micro bridges are fabricated and evaluated by SEM. |
| first_indexed | 2025-02-19T03:41:04Z |
| format | Thesis-Master by Coursework |
| id | ntu-10356/179410 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2025-02-19T03:41:04Z |
| publishDate | 2024 |
| publisher | Nanyang Technological University |
| record_format | dspace |
| spelling | ntu-10356/1794102024-08-02T15:43:28Z Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure Zhu, Junlei Lee Seok Woo School of Electrical and Electronic Engineering Centre for Micro-/Nano-electronics (NOVITAS) sw.lee@ntu.edu.sg Chemistry Engineering Physics Maskless lithography UV exposure SU-8 Maskless lithography has a broad prospect in fabricating 3D microstructures by negative photoresist SU-8, which is popular in MEMS and microfluidics application. Thus, in this dissertation project, I study the optimal UV exposure condition for the DMD-based maskless lithography and build some 3D microstructures by SU-8 photoresist. For SU-8 3050 under 10x Lens, the optimal results are obtained at 60%intensity with 300s exposure time. For SU-8 3010 under 10x Lens, the optimal results are obtained at 50% intensity with 200s exposure time or 60% intensity with 300s exposure time. For SU-8 3050 under 20x Lens, the optimal results are obtained at 70% intensity with 100s exposure time. For SU-8 3010 under 20x Lens, the optimal results are obtained at 40% intensity with 400s exposure time. The 3D SU-8 microstructures can be fabricated by multi-exposure or shallow exposure methods. The former one is suitable for stacked patterns and the other one is suitable for bridge structures. A micromixer and several micro bridges are fabricated and evaluated by SEM. Master's degree 2024-07-31T08:24:34Z 2024-07-31T08:24:34Z 2024 Thesis-Master by Coursework Zhu, J. (2024). Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure. Master's thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/179410 https://hdl.handle.net/10356/179410 en application/pdf Nanyang Technological University |
| spellingShingle | Chemistry Engineering Physics Maskless lithography UV exposure SU-8 Zhu, Junlei Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure |
| title | Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure |
| title_full | Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure |
| title_fullStr | Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure |
| title_full_unstemmed | Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure |
| title_short | Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure |
| title_sort | optimization of 3d su 8 microstructures using mask less lithography and ultraviolet exposure |
| topic | Chemistry Engineering Physics Maskless lithography UV exposure SU-8 |
| url | https://hdl.handle.net/10356/179410 |
| work_keys_str_mv | AT zhujunlei optimizationof3dsu8microstructuresusingmasklesslithographyandultravioletexposure |