Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure
Maskless lithography has a broad prospect in fabricating 3D microstructures by negative photoresist SU-8, which is popular in MEMS and microfluidics application. Thus, in this dissertation project, I study the optimal UV exposure condition for the DMD-based maskless lithography and build some 3D mic...
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| Format: | Thesis-Master by Coursework |
| Language: | English |
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Nanyang Technological University
2024
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| Online Access: | https://hdl.handle.net/10356/179410 |