Ferroelectric thin films by RF sputtering technology
A simple hydrogen interface-blocking model is discussed.
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Format: | Research Report |
Published: |
2008
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Online Access: | http://hdl.handle.net/10356/2733 |
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author | Zhu, Weiguang |
author2 | School of Electrical and Electronic Engineering |
author_facet | School of Electrical and Electronic Engineering Zhu, Weiguang |
author_sort | Zhu, Weiguang |
collection | NTU |
description | A simple hydrogen interface-blocking model is discussed. |
first_indexed | 2025-02-19T03:21:09Z |
format | Research Report |
id | ntu-10356/2733 |
institution | Nanyang Technological University |
last_indexed | 2025-02-19T03:21:09Z |
publishDate | 2008 |
record_format | dspace |
spelling | ntu-10356/27332023-03-04T03:24:50Z Ferroelectric thin films by RF sputtering technology Zhu, Weiguang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics A simple hydrogen interface-blocking model is discussed. RG 56/96 2008-09-17T09:13:58Z 2008-09-17T09:13:58Z 2000 2000 Research Report http://hdl.handle.net/10356/2733 Nanyang Technological University application/pdf |
spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Zhu, Weiguang Ferroelectric thin films by RF sputtering technology |
title | Ferroelectric thin films by RF sputtering technology |
title_full | Ferroelectric thin films by RF sputtering technology |
title_fullStr | Ferroelectric thin films by RF sputtering technology |
title_full_unstemmed | Ferroelectric thin films by RF sputtering technology |
title_short | Ferroelectric thin films by RF sputtering technology |
title_sort | ferroelectric thin films by rf sputtering technology |
topic | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics |
url | http://hdl.handle.net/10356/2733 |
work_keys_str_mv | AT zhuweiguang ferroelectricthinfilmsbyrfsputteringtechnology |