Ferroelectric thin films by RF sputtering technology

Ferroelectric thin films by RF sputtering technology

A simple hydrogen interface-blocking model is discussed.

Bibliographic Details
Main Author:	Zhu, Weiguang
Other Authors:	School of Electrical and Electronic Engineering
Format:	Research Report
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	http://hdl.handle.net/10356/2733

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