Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications.
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| Format: | Research Report |
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2008
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| Online Access: | http://hdl.handle.net/10356/3016 |
| _version_ | 1826111969575305216 |
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| author | Yoon, Soon Fatt. |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Yoon, Soon Fatt. |
| author_sort | Yoon, Soon Fatt. |
| collection | NTU |
| description | Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications. |
| first_indexed | 2024-10-01T02:59:30Z |
| format | Research Report |
| id | ntu-10356/3016 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T02:59:30Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/30162023-03-04T03:19:48Z Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications Yoon, Soon Fatt. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications. 2008-09-17T09:18:53Z 2008-09-17T09:18:53Z 1999 1999 Research Report http://hdl.handle.net/10356/3016 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics Yoon, Soon Fatt. Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications |
| title | Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications |
| title_full | Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications |
| title_fullStr | Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications |
| title_full_unstemmed | Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications |
| title_short | Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications |
| title_sort | development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics |
| url | http://hdl.handle.net/10356/3016 |
| work_keys_str_mv | AT yoonsoonfatt developmentofamorphoussiliconcarbidesemiconductorthinfilmsforoptoelectronicdeviceapplications |